Chemical mechanical polishing of hard disk substrate with α-alumina-g-polystyrene sulfonic acid composite abrasive

被引：29

作者：

Lei, Hong ^{[1
]}

Bu, Naijing ^{[1
]}

Chen, Ruling ^{[1
]}

Hao, Ping ^{[1
]}

Neng, Sima ^{[2
]}

Tu, Xifu ^{[2
]}

Yuen, Kwok ^{[2
]}

机构：

[1] Shanghai Univ, Res Ctr Nanosci & Nanotechnol, Shanghai 200444, Peoples R China

[2] Shenzhen Kaifa Magnet Recording Co LTD, Shenzhen 518035, Peoples R China

来源：

THIN SOLID FILMS | 2010年 / 518卷 / 14期

基金：

中国国家自然科学基金;

关键词：

Chemical mechanical polishing; Hard disk substrate; alpha-Alumina-g-polystyrene sulfonic acid; Composite abrasive; Cleaning; CMP; PARTICLES; COATINGS; DEFORMATION; SURFACE; SLURRY;

D O I：

10.1016/j.tsf.2010.01.003

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

alpha-Alumina-g-polystyrene sulfonic acid (alpha-Al2O3-g-PSS) composite abrasive was prepared by surface activation, graft polymerization and sulfonation, successively. The composition, dispersibility and morphology of the product were characterized by Fourier transformed infrared spectroscopy, laser particle size analysis and scanning electron microscopy, respectively. The chemical mechanical polishing (CMP) performances of the composite abrasive on hard disk substrate with nickel-phosphorous plating were investigated. The microscopy images of the polished surfaces show that alpha-Al2O3-g-PSS composite abrasive results in improved CMP and post-CMP cleaning performances than pure a-alumina abrasive under the same testing conditions. (C) 2010 Elsevier B.V. All rights reserved.

引用

页码：3792 / 3796

页数：5

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