Excess noise in polysilicon thin film transistors operated in kink regime

被引:3
作者
Giovannini, S
Mariucci, L
Pecora, A
Foglietti, V
Fortunato, G
Reita, C
机构
[1] CNR, IESS, I-00156 Rome, Italy
[2] Thomson CSF, LCR, F-91404 Orsay, France
关键词
thin film transistors; polysilicon; impact ionisation;
D O I
10.1049/el:19971392
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Low frequency noise in polysilicon thin film transistors (TFTs) has been investigated for different operating conditions. When the devices are biased in the linear regime, the 1/f noise can be ascribed to carrier number fluctuations, When the devices are biased above pinch-off, an anomalous current increase appears, related to impact ionisation (the kink effect), with an associated excess noise. This excess noise can be attributed, in analogy with SOI-MOSFETs, to additional fluctuations relating to the parasitic bipolar transistor carrier transport, responsible for the enhancement of the anomalous current increase in polysilicon TFTs.
引用
收藏
页码:2075 / 2077
页数:3
相关论文
共 11 条
[1]   Large 1/f noise in polysilicon TFT loads and its effects on the stability of SRAM cells [J].
Aoki, M ;
Hashimoto, T ;
Yamanaka, T ;
Nagano, T .
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1996, 35 (2B) :838-841
[2]   Noise performances in polycrystalline silicon thin-film transistors fabricated by excimer laser crystallization [J].
Carluccio, R ;
Corradetti, A ;
Fortunato, G ;
Reita, C ;
Legagneux, P ;
Plais, F ;
Pribat, D .
APPLIED PHYSICS LETTERS, 1997, 71 (05) :578-580
[3]   EVIDENCE OF CARRIER NUMBER FLUCTUATION AS ORIGIN OF 1/F NOISE IN POLYCRYSTALLINE SILICON THIN-FILM TRANSISTORS [J].
CORRADETTI, A ;
LEONI, R ;
CARLUCCIO, R ;
FORTUNATO, G ;
REITA, C ;
PLAIS, F ;
PRIBAT, D .
APPLIED PHYSICS LETTERS, 1995, 67 (12) :1730-1732
[4]   CURRENT-KINK NOISE OF N-CHANNEL ENHANCEMENT ESFI-MOS SOS TRANSISTORS [J].
FICHTNER, W ;
HOCHMAIR, E .
ELECTRONICS LETTERS, 1977, 13 (22) :675-676
[5]   IMPROVED ANALYSIS OF LOW-FREQUENCY NOISE IN FIELD-EFFECT MOS-TRANSISTORS [J].
GHIBAUDO, G ;
ROUX, O ;
NGUYENDUC, C ;
BALESTRA, F ;
BRINI, J .
PHYSICA STATUS SOLIDI A-APPLIED RESEARCH, 1991, 124 (02) :571-581
[6]   Hot-carrier-induced modifications to the noise performance of polycrystalline silicon thin-film transistors [J].
Giovannini, S ;
Carluccio, R ;
Mariucci, L ;
Pecora, A ;
Fortunato, G ;
Reita, C ;
Plais, F ;
Pribat, D .
APPLIED PHYSICS LETTERS, 1997, 71 (09) :1216-1218
[7]  
JOMAAH J, 1996, P 26 EUR SOL STAT DE, P87
[8]   DESIGN AND OPERATION OF POLY-SI ANALOG CIRCUITS [J].
REITA, C ;
FLUXMAN, S .
IEE PROCEEDINGS-CIRCUITS DEVICES AND SYSTEMS, 1994, 141 (01) :60-64
[9]   THE KINK-RELATED EXCESS LOW-FREQUENCY NOISE IN SILICON-ON-INSULATOR MOSTS [J].
SIMOEN, E ;
MAGNUSSON, U ;
ROTONDARO, ALP ;
CLAEYS, C .
IEEE TRANSACTIONS ON ELECTRON DEVICES, 1994, 41 (03) :330-339
[10]   PROPERTIES OF ESFI MOS-TRANSISTORS DUE TO FLOATING SUBSTRATE AND FINITE VOLUME [J].
TIHANYI, J ;
SCHLOTTERER, H .
IEEE TRANSACTIONS ON ELECTRON DEVICES, 1975, 22 (11) :1017-1023