Reactivity of SiCl and SiF groups in SiO2 glass with mobile interstitial O2 and H2O molecules

被引：11

作者：

Kajihara, Koichi

Hirano, Masahiro

Skuja, Linards

Hosono, Hideo

机构：

[1] Tokyo Inst Technol, Frontier Collaborat Res Ctr,SORST, Japan Sci & Technol Agcy, ERATO,Transparent Electroact Mat Project,Midori K, Yokohama, Kanagawa 2268503, Japan

[2] Latvian State Univ, Inst Solid State Phys, LV-1063 Riga, Latvia

[3] Tokyo Inst Technol, Mat & Struct Lab, Midori Ku, Yokohama, Kanagawa 2268503, Japan

[4] Tokyo Inst Technol, Frontier Collaborat Res Ctr, Midori Ku, Yokohama, Kanagawa 2268503, Japan

来源：

JOURNAL OF NON-CRYSTALLINE SOLIDS | 2007年 / 353卷 / 5-7期

关键词：

chemical properties; diffusion and transport; optical properties; absorption;

D O I：

10.1016/j.jnoncrysol.2006.10.038

中图分类号：

TQ174 [陶瓷工业]; TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

Reactions of common network-bound halogens in synthetic SiO2 glass, SiCl and SiF groups, with interstitial O-2 and H2O molecules incorporated by thermally annealing were studied. It was found that the chemical properties are distinctly different between SiCl and SiF groups. SiCl groups react with interstitial O-2 and H2O to form interstitial Cl-2 and HCl, respectively. In contrast, formation of interstitial F-2 and HF due to the reaction of SiF groups with interstitial O-2 and H2O is not observed. The reactivity of SiCl and SiF groups is in accord with the properties and thermodynamic data of their respective analogous compounds, SiCl4 and SiF4. (c) 2007 Elsevier B.V. All rights reserved.

引用

页码：514 / 517

页数：4

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