New microscopic polishing with magnetic compound fluid (MCF)

被引:28
作者
Shimada, K
Akagami, Y
Kamiyama, S
Fujita, T
Miyazaki, T
Shibayama, A
机构
[1] Akita Prefectural Univ, Tsuchiya, Honjyo 0150055, Japan
[2] Akita Prefectural Ind Technol Ctr, Akita 0101623, Japan
[3] Akita Univ, Akita 0108502, Japan
关键词
D O I
10.1106/104538902026159
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
We propose a magnetic compound fluid (MCF) as a new smart fluid. This fluid includes mum size magnetite and gm size iron particles in a solvent. The magnetic effect can be expected to demonstrate between the magnetic fluid (MF) and magneto-rheological fluid (MRF). Moreover, the magnitude of the shear stress to the shear rate under steady magnetic field can be larger than MRF by varying the compound rate of the MF and MRF. This report shows an experimental application of microscopic polishing with the MCF. We examined the surface roughness of flat titanium material to the attached rotating plate with 15 rpm under magnetic field. By comparing the roughness between the MCF and the MR, the polished plate is more uniformly over the plate with the MCF than the MR. Further the roughness of R-y and R-a are larger under fluctuating magnetic field than steady magnetic field. The more effective polishing can be explained with the cluster model of particles.
引用
收藏
页码:405 / 408
页数:4
相关论文
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