Nondestructive measurement of layer thickness in double heterostructures by X-ray double crystal diffraction

被引：0

作者：

Qu, Y ^{[1
]}

Li, XQ ^{[1
]}

Song, XW ^{[1
]}

Zhang, XD ^{[1
]}

Wang, L ^{[1
]}

Qie, XP ^{[1
]}

机构：

[1] Changchun Inst Opt & Fine Mech, State Key Lab High Power Semicond Lasers, Changchun 130022, Peoples R China

来源：

THIRD INTERNATIONAL CONFERENCE ON THIN FILM PHYSICS AND APPLICATIONS | 1998年 / 3175卷

关键词：

double heterostructures; X-ray diffraction; thin layer thickness;

D O I：

10.1117/12.300707

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

In this paper we introduce a method of measuring thin layer thickness using a sandwich structure of the In0.43Ga0.57As0.15P0.85/In0.13Ga0.87As0.75P0.25/In0.43Ga0.57As0.15P0.85 DH with the interference fringes in rocking curve by X-ray double-crystal diffraction.

引用

页码：378 / 380

页数：3