Anisotropic Metamaterial as an Antireflection Layer at Extreme Angles

被引:19
|
作者
He, Yuchu [1 ]
Eleftheriades, George V. [1 ]
机构
[1] Univ Toronto, Edward S Rogers Sr Dept Elect & Comp Engn, Toronto, ON M5S, Canada
关键词
Anisotropic; antireflection (AR); impedance matching; metamaterial; EFFECTIVE PARAMETERS;
D O I
10.1109/TAP.2017.2710213
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
A novel antireflection (AR) theory based on an anisotropic metamaterial is presented in this paper. Based on this theory, we derive the required anisotropic material parameters for perfecting matching at a particular frequency for a particular angle of incidence, including extreme angles. For a proof of concept, the anisotropic AR layers are synthesized with metamaterial structures and near perfect matching is demonstrated in simulation at 88 degrees incidence for both transverse-electric and transverse-magnetic polarizations. For experimental validation, the AR layer is redesigned to match at 60 degrees in order to avoid spill-over losses in the quasi-optical measurement due to the finite substrate size. Excellent agreement is observed between the simulation and measurement results.
引用
收藏
页码:4102 / 4114
页数:13
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