Review High-voltage SiC power devices for improved energy efficiency

被引:56
作者
Kimoto, Tsunenobu [1 ]
机构
[1] Kyoto Univ, Dept Elect Sci & Engn, Kyoto, Japan
来源
PROCEEDINGS OF THE JAPAN ACADEMY SERIES B-PHYSICAL AND BIOLOGICAL SCIENCES | 2022年 / 98卷 / 04期
基金
日本科学技术振兴机构;
关键词
silicon carbide (SiC); power device; field-effect transistor; avalanche breakdown; channel mobility; carrier lifetime; SILICON-CARBIDE; MOBILITY;
D O I
10.2183/pjab.98.011
中图分类号
O [数理科学和化学]; P [天文学、地球科学]; Q [生物科学]; N [自然科学总论];
学科分类号
07 ; 0710 ; 09 ;
摘要
Silicon carbide (SiC) power devices significantly outperform the well-established silicon (Si) devices in terms of high breakdown voltage, low power loss, and fast switching. This review briefly introduces the major features of SiC power devices and then presents research works on breakdown phenomena in SiC pn junctions and related discussion which takes into account the energy band structure. Next, recent progress in SiC metal-oxide-semiconductor field effect transistors, which are the most important unipolar devices, is described with an emphasis on the improvement of channel mobility at the SiO2/SiC interface. The development of SiC bipolar devices such as pin diodes and insulated gate bipolar transistors, which are promising for ultrahigh-voltage (>10 kV) applications, are introduced and the effect of carrier lifetime enhancement is demonstrated. The current status of mass production and how SiC power devices can contribute to energy saving are also described.
引用
收藏
页码:161 / 189
页数:29
相关论文
共 124 条
[1]  
Afanas'ev VV, 1997, PHYS STATUS SOLIDI A, V162, P321, DOI 10.1002/1521-396X(199707)162:1<321::AID-PSSA321>3.0.CO
[2]  
2-F
[3]  
Agarwal A.K., 1997, IEEE ELECTR DEVICE L, V18, p586 588
[4]   A new degradation mechanism in high-voltage SiC power MOSFETs [J].
Agarwal, Anant ;
Fatima, Husna ;
Haney, Sarah ;
Ryu, Sei-Hyung .
IEEE ELECTRON DEVICE LETTERS, 2007, 28 (07) :587-589
[5]  
Baliga BJ., 2010, Fundamentals of power semiconductor devices
[6]  
Bhatnagar M., 1993, IEEE T ELECT DEV, V40, p645 655
[7]  
Burk A., 2006, CHEM VAPOR DEPOS, V12, p465 473
[8]  
Cheng L., 2014, MAT SCI FORUM, V778-780
[9]  
Choyke W.J., 1997, SILICON CARBIDE REV
[10]   Improved inversion channel mobility for 4H-SiC MOSFETs following high temperature anneals in nitric oxide [J].
Chung, GY ;
Tin, CC ;
Williams, JR ;
McDonald, K ;
Chanana, RK ;
Weller, RA ;
Pantelides, ST ;
Feldman, LC ;
Holland, OW ;
Das, MK ;
Palmour, JW .
IEEE ELECTRON DEVICE LETTERS, 2001, 22 (04) :176-178