Characterization and properties of TiN-containing amorphous Ti-Si-N nanocomposite coatings prepared by arc assisted middle frequency magnetron sputtering

被引:28
作者
Zou, C. W.
Wang, H. J.
Li, M.
Yu, Y. F.
Liu, C. S.
Guo, L. P.
Fu, D. J. [1 ]
机构
[1] Wuhan Univ, Dept Phys, Accelerator Lab, Wuhan 430072, Peoples R China
基金
中国国家自然科学基金;
关键词
Ti-Si-N nanocomposite coatings; Middle frequency magnetron sputtering; Friction coefficient; Hardness; THIN-FILMS; THERMAL-STABILITY; MICROSTRUCTURE; DEPOSITION; OXIDATION; NITRIDE; SILICON; HARD; CVD;
D O I
10.1016/j.vacuum.2009.10.050
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
TiN-containing amorphous Ti-Si-N (nc-TiN/a-Si3N4) nanocomposite coatings were deposited by using a modified closed field unbalanced middle frequency magnetron sputtering system which is arc assisted and consists of two circles of targets, at a substrate temperature of 400 degrees C. The coatings exhibit good mechanical properties that are greatly influenced by the total gas pressure and N-2/Ar ratios. For coatings prepared at a N-2/Ar ratio of 3:1, the hardness increases from 24 GPa at a total gas pressure of 0.2 Pa-58 GPa at 0.4 Pa, and then, the hardness decreases gradually when the total gas pressure was further increased. On the other hand, the friction coefficient decreases monotonously with increasing total gas pressure. XRD, XPS and high resolution TEM experiments showed that the coatings contain TiN nanocrystals embedded in the amorphous Si3N4 Matrix. The coating deposited under optimum conditions exhibits excellent tribological performance with a low friction coefficient of 0.42 and a high hardness of 58 GPa. These properties make it possible for industrial applications. (C) 2009 Elsevier Ltd. All rights reserved.
引用
收藏
页码:817 / 822
页数:6
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