In this paper we demonstrate the functionalization of single-walled carbon nanotubes prepared by chemical vapor deposition. The chosen functionalization agents were alkyl-halides such as trifluoromethane (TFM) and trichloromethane (TCM); or double bond containing alkyl-halides as tetrachloroethylene (TCE) and hexafluoropropene (HFP) that can easily form radicals. Functionalization of samples was carried out under mild conditions, by ball milling of nanotubes in an atmosphere of functionalization agent, at room temperature. For the sake of comparison, chlorination was also performed by chlorine gas. In this process the cleavage of nanotube C-C bonds results in active sites, which can activate molecules in gas phase or adsorbed on the surface of carbon nanotubes. Halogenated samples were characterized by means of particle induced gamma-ray emission, transmission electron microscopy, thermogravimetry, and X-ray photoelectron spectroscopy. We concluded that this method gives functionalized single-walled carbon nanotubes in the range of 0.3-3.5wt.% of fluorine and 5.5-17.5wt.% of chlorine. (C) 2004 Elsevier Ltd. All rights reserved.
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Univ Teknol Malaysia, Malaysia Japan Int Inst Technol, Dept Mech Precis Engn, Kuala Lumpur 54100, MalaysiaUniv Teknol Malaysia, Malaysia Japan Int Inst Technol, Dept Mech Precis Engn, Kuala Lumpur 54100, Malaysia
Wahab, A. M. Abdul
Nuh, A.
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Univ Teknol Malaysia, Malaysia Japan Int Inst Technol, Dept Mech Precis Engn, Kuala Lumpur 54100, MalaysiaUniv Teknol Malaysia, Malaysia Japan Int Inst Technol, Dept Mech Precis Engn, Kuala Lumpur 54100, Malaysia
Nuh, A.
Rasid, Z. A.
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Univ Teknol Malaysia, Malaysia Japan Int Inst Technol, Dept Mech Precis Engn, Kuala Lumpur 54100, MalaysiaUniv Teknol Malaysia, Malaysia Japan Int Inst Technol, Dept Mech Precis Engn, Kuala Lumpur 54100, Malaysia
Rasid, Z. A.
Abu, A.
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Univ Teknol Malaysia, Malaysia Japan Int Inst Technol, Dept Mech Precis Engn, Kuala Lumpur 54100, MalaysiaUniv Teknol Malaysia, Malaysia Japan Int Inst Technol, Dept Mech Precis Engn, Kuala Lumpur 54100, Malaysia
Abu, A.
Tanasta, Z.
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Univ Teknol Malaysia, Malaysia Japan Int Inst Technol, Dept Mech Precis Engn, Kuala Lumpur 54100, MalaysiaUniv Teknol Malaysia, Malaysia Japan Int Inst Technol, Dept Mech Precis Engn, Kuala Lumpur 54100, Malaysia
Tanasta, Z.
Hassan, M. Z.
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Univ Teknol Malaysia, Razak Sch Engn & Adv Technol, Dept Engn, Kuala Lumpur 54100, MalaysiaUniv Teknol Malaysia, Malaysia Japan Int Inst Technol, Dept Mech Precis Engn, Kuala Lumpur 54100, Malaysia
Hassan, M. Z.
Mahmud, J.
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Univ Teknol MARA, Fac Mech Engn, Shah Alam 40450, Selangor, MalaysiaUniv Teknol Malaysia, Malaysia Japan Int Inst Technol, Dept Mech Precis Engn, Kuala Lumpur 54100, Malaysia
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Univ Minnesota, Army High Performance Comp Res Ctr, Minneapolis, MN 55415 USAUniv Minnesota, Army High Performance Comp Res Ctr, Minneapolis, MN 55415 USA