Contact resistance and overlapping capacitance in flexible sub-micron long oxide thin-film transistors for above 100MHz operation

被引:60
作者
Muenzenrieder, Niko [1 ]
Salvatore, Giovanni A. [1 ]
Petti, Luisa [1 ]
Zysset, Christoph [1 ]
Buethe, Lars [1 ]
Vogt, Christian [1 ]
Cantarella, Giuseppe [1 ]
Troester, Gerhard [1 ]
机构
[1] Swiss Fed Inst Technol, Elect Lab, CH-8092 Zurich, Switzerland
关键词
HIGH-PERFORMANCE; ELECTRONICS; FABRICATION; FREQUENCY; CIRCUITS; LENGTH;
D O I
10.1063/1.4905015
中图分类号
O59 [应用物理学];
学科分类号
摘要
In recent years new forms of electronic devices such as electronic papers, flexible displays, epidermal sensors, and smart textiles have become reality. Thin-film transistors (TFTs) are the basic blocks of the circuits used in such devices and need to operate above 100 MHz to efficiently treat signals in RF systems and address pixels in high resolution displays. Beyond the choice of the semiconductor, i.e., silicon, graphene, organics, or amorphous oxides, the junctionless nature of TFTs and its geometry imply some limitations which become evident and important in devices with scaled channel length. Furthermore, the mechanical instability of flexible substrates limits the feature size of flexible TFTs. Contact resistance and overlapping capacitance are two parasitic effects which limit the transit frequency of transistors. They are often considered independent, while a deeper analysis of TFTs geometry imposes to handle them together; in fact, they both depend on the overlapping length (L-OV) between source/drain and the gate contacts. Here, we conduct a quantitative analysis based on a large number of flexible ultra-scaled IGZO TFTs. Devices with three different values of overlap length and channel length down to 0.5 mu m are fabricated to experimentally investigate the scaling behavior of the transit frequency. Contact resistance and overlapping capacitance depend in opposite ways on L-OV. These findings establish routes for the optimization of the dimension of source/drain contact pads and suggest design guidelines to achieve megahertz operation in flexible IGZO TFTs and circuits. (C) 2014 AIP Publishing LLC.
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页数:5
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共 39 条
  • [1] Angelopoulos EA, 2010, INT EL DEVICES MEET
  • [2] Contact Resistance and Megahertz Operation of Aggressively Scaled Organic Transistors
    Ante, Frederik
    Kaelblein, Daniel
    Zaki, Tarek
    Zschieschang, Ute
    Takimiya, Kazuo
    Ikeda, Masaaki
    Sekitani, Tsuyoshi
    Someya, Takao
    Burghartz, Joachim N.
    Kern, Klaus
    Klauk, Hagen
    [J]. SMALL, 2012, 8 (01) : 73 - 79
  • [3] Bae S, 2010, NAT NANOTECHNOL, V5, P574, DOI [10.1038/nnano.2010.132, 10.1038/NNANO.2010.132]
  • [4] High-Performance, Highly Bendable MoS2 Transistors with High-K Dielectrics for Flexible Low-Power Systems
    Chang, Hsiao-Yu
    Yang, Shixuan
    Lee, Jongho
    Tao, Li
    Hwang, Wan-Sik
    Jena, Debdeep
    Lu, Nanshu
    Akinwande, Deji
    [J]. ACS NANO, 2013, 7 (06) : 5446 - 5452
  • [5] Woven Electronic Fibers with Sensing and Display Functions for Smart Textiles
    Cherenack, Kunigunde
    Zysset, Christoph
    Kinkeldei, Thomas
    Muenzenrieder, Niko
    Troester, Gerhard
    [J]. ADVANCED MATERIALS, 2010, 22 (45) : 5178 - +
  • [6] Contact resistance dependent scaling-down behavior of amorphous InGaZnO thin-film transistors
    Cho, Edward Namkyu
    Kang, Jung Han
    Yun, Ilgu
    [J]. CURRENT APPLIED PHYSICS, 2011, 11 (04) : 1015 - 1019
  • [7] Correlation between Ti source/drain contact and performance of InGaZnO-based thin film transistors
    Choi, Kwang-Hyuk
    Kim, Han-Ki
    [J]. APPLIED PHYSICS LETTERS, 2013, 102 (05)
  • [8] Boron nitride substrates for high-quality graphene electronics
    Dean, C. R.
    Young, A. F.
    Meric, I.
    Lee, C.
    Wang, L.
    Sorgenfrei, S.
    Watanabe, K.
    Taniguchi, T.
    Kim, P.
    Shepard, K. L.
    Hone, J.
    [J]. NATURE NANOTECHNOLOGY, 2010, 5 (10) : 722 - 726
  • [9] Comparison of the effects of Ar and H2 plasmas on the performance of homojunctioned amorphous indium gallium zinc oxide thin film transistors
    Du Ahn, Byung
    Shin, Hyun Soo
    Kim, Hyun Jae
    Park, Jin-Seong
    Jeong, Jae Kyeong
    [J]. APPLIED PHYSICS LETTERS, 2008, 93 (20)
  • [10] Fang H, 2012, NANO LETT, V12, P3788, DOI [10.1021/nl301702r, 10.1021/nl3040674]