Stability of terphenyl self-assembled monolayers exposed under UV irradiation

被引：16
作者：
Ishida, T
Sano, M
Fukushima, H
Ishida, M
Sasaki, S
机构：
[1] AIST, IMSE, Tsukuba, Ibaraki 3058564, Japan
[2] EPSON Corp, SEIKO, TPRC, Nagano 3928502, Japan
来源：
LANGMUIR | 2002年 / 18卷 / 26期
关键词：
D O I：
10.1021/la0262001
中图分类号：
O6 [化学];
学科分类号：
0703 ;
摘要：
The effect of 245 nm UV light on SAMs on Au(111) generated from derivatives of TP1, BM, and C10 was studied. XPS and STM data revealed that the BM and C10 molecules were partially desorbed by irradiation for 3 h, which such desorption was not observed in the TP1 SAMs. Furthermore, even when using stronger UV light which could decompose alkanethiol SAMs more efficiently, XPS and STM data confirmed no decomposition after irradiation for 24 h. The data demonstrate that TP1 SAMs had higher stability under UV irradiation.
引用
收藏
页码：10496 / 10499
页数：4
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