Electron Bombardment of Nitrogen Gas Ionization in a DC Electric Field

被引:0
作者
Dhofir, Moch [1 ]
Hasanah, Rini Nur [1 ]
Martineac, Corina [2 ]
机构
[1] Univ Brawijaya, Elect Engn Dept, Malang, Indonesia
[2] Tech Univ Cluj Napoca, Elect Engn Facilty, Cluj Napoca, Romania
来源
2020 10TH ELECTRICAL POWER, ELECTRONICS, COMMUNICATIONS, CONTROLS AND INFORMATICS SEMINAR (EECCIS) | 2020年
关键词
electron; bombardment; nitrogen; aluminium; electric field;
D O I
暂无
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Nitrogen gas can be ionized by the high field produced by the needle-plate electrode arrangement. Nitrogen gas ionization occurs around the tip of the needle with the highest field intensity. Each ionization process produces one electron and one positive ion from the nitrogen gas molecule. If the needle electrode voltage is negative polarity and the plate is grounded, then in the dc electric field, electrons will move accelerated towards the electrode plate and positive ions will always be present around the tip of the needle and a portion of the remainder is dissipated into the needle electrode. The level of electron energy that bombards a plate electrode is determined by the level of the electric field and the pressure of the Nitrogen gas. The greater the energy kinetic electron when it hits the electrode plate, the cavity diameter will also be greater. However, the energy of electrons when hitting plates varies because the final free path of electrons is probabilistic.
引用
收藏
页码:76 / 80
页数:5
相关论文
共 18 条
[1]  
Arora R, 2011, HIGH VOLTAGE AND ELECTRICAL INSULATION ENGINEERING, P1, DOI 10.1002/9780470947906
[2]  
Curry R.D, 2011, 2011 IEEE PULS POW C
[3]  
Dhofir M., 2017, INT C EL EL INF ENG, P25
[4]  
He Ran, 2014 INT C EL PACK I
[5]  
Holtzhausen JP, 2011, HIGH VOLTAGE ENG PRA
[6]  
Kind D., 1978, INTRO HIGH VOLTAGE E, P53
[7]  
Kuffel J., 2000, High-Voltage Engineering: Fundamentals, V2nd edn
[8]   Enhanced energy deposition efficiency of glow discharge electron beams for metal surface treatment [J].
Mingolo, N ;
Cesa, Y ;
Martínez, OE ;
Etcheverry, JI ;
Rocca, JJ .
IEEE TRANSACTIONS ON PLASMA SCIENCE, 2000, 28 (02) :386-393
[9]  
Osipov I.V, 2008 17 INT CONV HIG
[10]  
Paek Kwang Hyun, 2008 IEEE 35 INT C P