Electronic structure of exfoliated and epitaxial hexagonal boron nitride

被引:21
作者
Koch, Roland J. [1 ]
Katoch, Jyoti [2 ]
Moser, Simon [1 ]
Schwarz, Daniel [1 ]
Kawakami, Roland K. [2 ]
Bostwick, Aaron [1 ]
Rotenberg, Eli [1 ]
Jozwiak, Chris [1 ]
Ulstrup, Soren [1 ,3 ]
机构
[1] EO Lawrence Berkeley Natl Lab, Adv Light Source, Berkeley, CA 94720 USA
[2] Ohio State Univ, Dept Phys, Columbus, OH 43210 USA
[3] Aarhus Univ, Dept Phys & Astron, Interdisciplinary Nanosci Ctr iNANO, DK-8000 Aarhus C, Denmark
基金
瑞士国家科学基金会;
关键词
GRAPHENE ELECTRONICS; LAYER GRAPHENE; SINGLE-CRYSTAL; HETEROSTRUCTURES; GROWTH; SEMICONDUCTOR; 6H-SIC(0001); SYMMETRY;
D O I
10.1103/PhysRevMaterials.2.074006
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Hexagonal boron nitride (hBN) is an essential component in van der Waals heterostructures as it provides high-quality and weakly interacting interfaces that preserve the electronic properties of adjacent materials. While exfoliated flakes of hBN have been extensively studied using electron transport and optical probes, detailed experimental measurements of the energy- and momentum-dependent electronic excitation spectrum are lacking. Here, we directly determine the full valence-band (VB) electronic structure of micrometer-sized exfoliated flakes of hBN using angle-resolved photoemission spectroscopy with micrometer spatial resolution. We identify the pi- and sigma-band dispersions, the hBN stacking order, and determine a total VB bandwidth of 19.4 eV. We compare these results with electronic structure data for epitaxial hBN on graphene on silicon carbide grown in situ using a borazine precursor. The epitaxial growth and electronic properties are investigated using photoemission electron microscopy. Our measurements show that the fundamental electronic properties of hBN are highly dependent on the fabrication strategy.
引用
收藏
页数:9
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