Spin injection into silicon detected by broadband ferromagnetic resonance spectroscopy

被引:9
|
作者
Ohshima, Ryo [1 ]
Klingler, Stefan [2 ,3 ]
Dushenko, Sergey [1 ]
Ando, Yuichiro [1 ]
Weiler, Mathias [2 ,3 ]
Huebl, Hans [2 ,3 ,4 ]
Shinjo, Teruya [1 ]
Goennenwein, Sebastian T. B. [2 ,3 ,4 ]
Shiraishi, Masashi [1 ]
机构
[1] Kyoto Univ, Dept Elect Sci & Engn, Kyoto 6158510, Japan
[2] Bayer Akad Wissensch, Walther Meissner Inst, D-85748 Garching, Germany
[3] Tech Univ Munich, Phys Dept, D-85748 Garching, Germany
[4] Nanosyst Initiat Munich, D-80799 Munich, Germany
关键词
D O I
10.1063/1.4983012
中图分类号
O59 [应用物理学];
学科分类号
摘要
We studied the spin injection in a NiFe(Py)/Si system using broadband ferromagnetic resonance spectroscopy. The Gilbert damping parameter of the Py layer on top of the Si channel was determined as a function of the Si doping concentration and Py layer thickness. For a fixed Py thickness, we observed an increase in the Gilbert damping parameter with decreasing resistivity of the Si channel. For a fixed Si doping concentration, we measured an increasing Gilbert damping parameter for decreasing Py layer thickness. No increase in the Gilbert damping parameter was found for Py/Si samples with an insulating interlayer. We attribute our observations to an enhanced spin injection into the low-resistivity Si by spin pumping. Published by AIP Publishing.
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页数:5
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