Self-assembled nanostructures of block copolymers on random copolymer brush

被引:3
作者
Kim, Bong Hoon [1 ]
Koo, Chong Min [2 ]
Jeong, Seong Jun [1 ]
Shin, Dong Ok [1 ]
Kim, Sang Ouk [1 ]
机构
[1] Korea Adv Inst Sci & Technol, Dept Mat Sci & Engn, 373-1 Guseong Dong, Taejon 305701, South Korea
[2] LG Chem, Daejeon 305380, South Korea
来源
ADVANCES IN NANOMATERIALS AND PROCESSING, PTS 1 AND 2 | 2007年 / 124-126卷
关键词
self-assembly; nanostructure; block copolymer; polymer brush;
D O I
10.4028/www.scientific.net/SSP.124-126.579
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
We synthesized the polymer brushes by conventional free radical polymerization and investigated the morphology evolution of block copolymer nanostructure on the brush treated surfaces. Our simple approach utilized a functionalized free radical initiator to add hydroxyl group to a chain end and an excess amount of a chain transfer agent to control the molecular weights of the brushes. The synthesized polymer brushes had narrow molecular weight distribution as well as hydroxyl end group and were successfully grafted onto silicon oxide layer by simple spin-coating and annealing process. The orientation of poly(styrene-block-methyl methacrylate)s (PS-b-PMMAs) coated on the brush grafted surface was finely controlled by the surface modification by polymer brushes.
引用
收藏
页码:579 / +
页数:2
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