The study of doped DLC films by Ti ion implantation

被引：50

作者：

Cui, L

Li, GQ ^{[1
]}

Chen, WW

Mu, ZX

Zhang, CW

Wang, L

机构：

[1] Dalian Univ Technol, State Key Lab Mat Modificat Laser Ion & Electron, Dalian 116024, Peoples R China

[2] Chinese Acad Sci, Dalian Inst Chem Phys, Dalian 116023, Peoples R China

[3] Dalian Univ Technol, Inst Met & Technol, Dalian 116024, Peoples R China

来源：

THIN SOLID FILMS | 2005年 / 475卷 / 1-2期

关键词：

diamond-like carbon films; ion implantation; Ti doped;

D O I：

10.1016/j.tsf.2004.08.051

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

Diamond-like carbon (DLC) films were prepared by unbalanced magnetron sputtering. Ti-doped DLC films were obtained by Ti ion implanted into the achieved DLC films using metal vapor vacuum arc (MEVVA). The effects of Ti+ ion implantation on the surface morphology, structure, and tribological properties of the DLC films were investigated by means of atomic force microscopy (AFM), Raman spectroscopy, transmission electron microscopy (TEM), X-ray photoelectron spectroscopy (XPS), and friction measurement. The smooth and uniform Ti-doped film with the surface roughness of 0.595 nm was obtained. Raman result revealed that the formation of DLC films and sp(2) bonds content increase by Ti+ ion implantation. TEM showed that the nanocrystalline phases of TiC were formed in the films. Ti+ was implanted into the interface between C and substrate, detecting the sputtering depth profiles of the film by XPS; thus, the interface was widened due to reserve diffusion. Tribological test experiment indicated that friction coefficient of the films decreased to approximately 0.15 by Ti+ ion implantation. (C) 2004 Published by Elsevier B.V.

引用

页码：279 / 282

页数：4

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