Rotary Spatial Plasma Enhanced Atomic Layer Deposition - an enabling manufacturing technology for μm-thick ALD films

被引：0
|
作者：
Sneck, Sami [1 ]
Soderlund, Mikko [1 ]
Bosund, Markus [1 ]
Soininen, Pekka [1 ]
机构：
[1] Beneq Oy, Olarinluoma 9, Espoo 02200, Finland
来源：
2017 CHINA SEMICONDUCTOR TECHNOLOGY INTERNATIONAL CONFERENCE (CSTIC 2017) | 2017年
关键词：
ALD; PEALD; rotary; spatial; deposition rate; batch; direct; DC plasma; high volume manufacturing;
D O I：
暂无
中图分类号：
TP3 [计算技术、计算机技术];
学科分类号：
0812 ;
摘要：
Atomic Layer Deposition (ALD) is well known for its high film quality and high conformality, but limited by the low deposition rate. Beneq proposes a novel approach using Rotary Spatial Plasma Enhanced ALD process, which can reach deposition rates lOx higher than traditional pulsed ALD. This technology also enables use of PEALD in batch mode with high throughput. This paper describes the technology in more details.
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页数：2
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