Titanium(IV) oxide thin films prepared from aqueous solution

被引：253

作者：

Deki, S

Aoi, Y

Hiroi, O

Kajinami, A

机构：

[1] Dept. of Chem. Sci. and Engineering, Faculty of Engineering, Kobe University, Nada, Kobe 657, Rokkodai-cho

来源：

CHEMISTRY LETTERS | 1996年 / 06期

关键词：

D O I：

10.1246/cl.1996.433

中图分类号：

O6 [化学];

学科分类号：

0703 ;

摘要：

Titanium oxide thin film could be prepared from (NH4)(2)TiF6 aqueous solution with addition of boric acid by Liquid Phase Deposition (LPD) process. The aspect and chemical composition of the deposited films were different according to the concentration range of (NH4)(2)TiF6 and H3BO3 in the treatment solution. The deposition rate of transparent TiO2 film increased with increasing concentration of added H3BO3.

引用

页码：433 / 434

页数：2

共 4 条

[1] FORMATION OF SILICON DIOXIDE FILMS IN ACIDIC SOLUTIONS [J].