Coefficient of thermal expansion and biaxial elastic modulus of β phase tantalum thin films

被引:32
作者
Knepper, Robert [1 ]
Baker, Shefford P. [1 ]
机构
[1] Cornell Univ, Dept Mat Sci & Engn, Ithaca, NY 14853 USA
基金
美国国家科学基金会;
关键词
D O I
10.1063/1.2734468
中图分类号
O59 [应用物理学];
学科分类号
摘要
The coefficient of thermal expansion and biaxial elastic modulus of metastable tetragonal beta-tantalum thin films were determined from the thermoelastic slopes of films deposited on (100) silicon and fused silica substrates. Measurements were made during heating, when the film was in the beta phase, and during cooling, after the film had transformed to the stable bcc alpha phase. While the thermal expansion coefficients of the two phases were similar, beta phase films were much more compliant than alpha films. The thermal expansion coefficient and biaxial elastic modulus of the alpha phase were consistent with values reported for bulk alpha tantalum. (c) 2007 American Institute of Physics.
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页数:3
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