High aspect ratio silicon micromachined heat exchanger

被引:0
|
作者
Bengtsson, J [1 ]
Wallman, L [1 ]
Laurell, T [1 ]
机构
[1] Lund Inst Technol, Dept Elect Measurements, S-22100 Lund, Sweden
来源
MICROREACTION TECHNOLOGY: INDUSTRIAL PROSPECTS | 2000年
关键词
micro heat exchanger; PN-etch stop; anisotropic; micro machined; silicon;
D O I
暂无
中图分类号
TQ [化学工业];
学科分类号
0817 ;
摘要
The fabrication process for a silicon micro machined heat exchanger is descibed. A thin walled, 7 mu m, channel structure defined by vertical channels, 360 mu m deep and 220 mu m wide, anisotropically etched in < 110 >-silicon followed by a pn-etch stop process provided a heat exchanger module in the shape of a "square wave" corrugated membrane. The double sided processing provided vertical channels interdigitated from one side to the other giving a counter flow component with rear side fluid access from the front side. The design allows the stacking of multiple elements to obtain a unit with the desired heat sink capacity.
引用
收藏
页码:573 / 577
页数:5
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