Rapid optical measurement of surface roughness of BiFeO3 films for nonvolatile memory application

被引：1

作者：

Kuo, Chil-Chyuan ^{[1
]}

Chao, Chin-Sheng

机构：

[1] Ming Chi Univ Technol, Dept Mech Engn, Taishan Taipei Hsien 243, Taiwan

来源：

JOURNAL OF RUSSIAN LASER RESEARCH | 2010年 / 31卷 / 03期

关键词：

optical inspection system; BiFeO3 (BFO) thin films; surface roughness; TOTAL INTEGRATED SCATTERING; THIN-FILMS; LASER CRYSTALLIZATION; SEMICONDUCTOR WAFERS; SI FILMS; GROWTH;

D O I：

10.1007/s10946-010-9144-4

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

An optical inspection system for rapid surface roughness measurement of BiFeO3 (BFO) thin films is developed. It is found that y = -121.45 x + 212.81 is a trend equation for characterizing the surface roughness of BFO thin films. The incident angle of 60au broken vertical bar is a good candidate for measuring the surface roughness of BFO thin films. The maximum measurement error rate of the optical inspection system developed is less than 2.6%. The savings in inspection time of the surface roughness of BiFeO3 thin films is up to 90%.

引用

页码：239 / 244

页数：6

共 16 条

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