Enhancement of Atmospheric Plasma Decomposition of Toluene Using Porous Dielectric Conformally Coated with Titanium Dioxide by Atomic Layer Deposition

被引:3
作者
Ivanova, Tatiana V. [1 ]
Hoder, Tomas [2 ]
Kaariainen, Marja-Leena [1 ]
Komlev, Andrei [3 ]
Brandenburg, Ronny [2 ]
Cameron, David C. [1 ]
机构
[1] Lappeenranta Univ Technol, ASTRaL, Mikkeli 50130, Finland
[2] INP Greifswald eV, Leibniz Inst Plasma Sci & Technol, D-17489 Greifswald, Germany
[3] Tech Univ, St Petersburg State Inst Technol, St Petersburg 190013, Russia
关键词
Titanium Dioxide; Dielectric Barrier Discharge; Atomic Layer Deposition; NONTHERMAL PLASMA; PHOTOCATALYTIC OXIDATION; BARRIER DISCHARGE; THIN-FILMS; TIO2; VOCS; DEGRADATION; ADSORPTION; ABATEMENT; CATALYST;
D O I
10.1166/sam.2014.1984
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
The use of atmospheric pressure plasmas together with catalysts for removal of organic volatile compounds (VOCs) from the atmosphere is an area of current research. Dielectric barrier discharge (DBD) systems are widely used to produce non-thermal atmospheric pressure plasmas. For the most effective use of catalysts, it is necessary to maximize the surface area which is exposed to the contaminant and to the active species from the plasma. In this work, we have used atomic layer deposition (ALD) to deposit titanium dioxide catalytic thin films in porous glass labyrinths. ALD is known to produce effective photocatalytic TiO2 layers and one of its characteristics is the ability to deposit on the internal surfaces within a complex porous material. The performance of a parallel plate DBD system has been tested for the decomposition of toluene. DBD systems with interelectrode material of (a) uncoated porous glass and (b) TiO2 coated porous glass have been studied. Porous glass has been used to increase the flow path of the gases and to maximize the surface area of the interelectrode medium. The effects of the thickness of TiO2 and specific input energy (SIE) on the conversion efficiency of the VOCs to CO2 and CO were measured. The breakdown products of the decomposition were determined by using FTIR absorption measurements for the exhaust gases. Based on these measurements, the carbon balance was close to 100%. The contribution of catalytic reactions to the decomposition became increasingly dominant as specific input energy was increased. The incorporation of the ALD TiO2 enabled the complete destruction of toluene at a concentration of 2450 ppm in air with an SIE of 336 J/l.
引用
收藏
页码:2098 / 2105
页数:8
相关论文
共 38 条
  • [21] Nanoporous Aluminum Oxide Membranes Coated with Atomic Layer Deposition-Grown Titanium Dioxide for Biomedical Applications: An In Vitro Evaluation
    Petrochenko, Peter E.
    Kumar, Girish
    Fu, Wujun
    Zhang, Qin
    Zheng, Jiwen
    Liang, Chengdu
    Goering, Peter L.
    Narayan, Roger J.
    JOURNAL OF BIOMEDICAL NANOTECHNOLOGY, 2015, 11 (12) : 2275 - 2285
  • [22] Atomic layer deposition of titanium dioxide films using a metal organic precursor (C12H23N3Ti) and H2O (DI water)
    Kim, Byunguk
    Lee, Namgue
    Park, Suhyeon
    Park, Taehun
    Song, Jaiwon
    Han, Seungwook
    Park, Hyunwoo
    Lee, Dahyun
    Kim, Hohoon
    Jeon, Hyeongtag
    JOURNAL OF ALLOYS AND COMPOUNDS, 2021, 857
  • [23] Continuous polymer films deposited on top of porous substrates using plasma-enhanced atomic layer deposition and molecular layer deposition
    Welch, Brian C.
    McIntee, Olivia M.
    Ode, Anand B.
    McKenzie, Bonnie B.
    Greenberg, Alan R.
    Bright, Victor M.
    George, Steven M.
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 2020, 38 (05):
  • [24] Reduction of Leakage Current and Enhancement of Dielectric Properties of Rutile-TiO2 Film Deposited by Plasma-Enhanced Atomic Layer Deposition
    Eun, Su Min
    Hwang, Ji Hyeon
    Choi, Byung Joon
    KOREAN JOURNAL OF MATERIALS RESEARCH, 2024, 34 (06): : 283 - 290
  • [25] Improving high-temperature capacitive energy storage of biaxially oriented polypropylene through titanium dioxide deposition layer by atmospheric pressure plasma jets
    Lv, Li
    Zhang, Chuansheng
    Zhang, Cheng
    Xu, Shaojun
    Xing, Zhaoliang
    Shao, Tao
    PLASMA PROCESSES AND POLYMERS, 2024, 21 (11)
  • [26] Microporous textured titanium dioxide films deposited at atmospheric pressure using dielectric barrier discharge assisted chemical vapor deposition
    Zhang, X. W.
    Han, G. R.
    THIN SOLID FILMS, 2008, 516 (18) : 6140 - 6144
  • [27] Prevention of Ultraviolet (UV)-Induced Surface Damage and Cytotoxicity of Polyethersulfone Using Atomic Layer Deposition (ALD) Titanium Dioxide
    Petrochenko, Peter E.
    Scarel, Giovanna
    Hyde, G. Kevin
    Parsons, Gregory N.
    Skoog, Shelby A.
    Zhang, Qin
    Goering, Peter L.
    Narayan, Roger J.
    JOM, 2013, 65 (04) : 550 - 556
  • [28] Substrate Dependent Growth Rate of Plasma-Enhanced Atomic Layer Deposition of Titanium Oxide Using N2O Gas
    Won, Seok-Jun
    Suh, Sungin
    Lee, Sang Woon
    Choi, Gyu-Jin
    Hwang, Cheol Seong
    Kim, Hyeong Joon
    ELECTROCHEMICAL AND SOLID STATE LETTERS, 2010, 13 (02) : G13 - G16
  • [29] Efficient water oxidation using α-Fe2O3 thin films conformally coated on vertically aligned titania nanotube arrays by atomic layer deposition
    Liu, Lifeng
    MATERIALS LETTERS, 2015, 159 : 284 - 288
  • [30] Improvement of Gate Dielectric Integrity Using O2 Plasma Treatment Prior to Atomic Layer Deposition on Chemical Vapor Deposition Grown Graphene
    Sul, Onejae
    Bong, Jaehoon
    Yoon, Alex
    Cho, Byung Jin
    JOURNAL OF NANOSCIENCE AND NANOTECHNOLOGY, 2015, 15 (01) : 220 - 223