Plasma-aided nanofabrication: where is the cutting edge?

被引:228
作者
Ostrikov, K. [1 ]
Murphy, A. B.
机构
[1] Univ Sydney, Sch Phys, Sydney, NSW 2006, Australia
[2] CSIRO Ind Phys, Lindfield, NSW 2070, Australia
关键词
CHEMICAL-VAPOR-DEPOSITION; INDUCTIVELY-COUPLED PLASMAS; LOW-TEMPERATURE DEPOSITION; WALLED CARBON NANOTUBES; SILICON-CARBIDE FILMS; CATHODIC ARC DEPOSITION; THERMAL PLASMA; LOW-FREQUENCY; SURFACE-WAVES; ATMOSPHERIC-PRESSURE;
D O I
10.1088/0022-3727/40/8/S01
中图分类号
O59 [应用物理学];
学科分类号
摘要
Plasma-aided nanofabrication is a rapidly expanding area of research spanning disciplines ranging from physics and chemistry of plasmas and gas discharges to solid state physics, materials science, surface science, nanoscience and nanotechnology and related engineering subjects. The current status of the research field is discussed and examples of superior performance and competitive advantage of plasma processes and techniques are given. These examples are selected to represent a range of applications of two major types of plasmas suitable for nanoscale synthesis and processing, namely thermally non-equilibrium and thermal plasmas. Major concepts and terminology used in the field are introduced. The paper also pinpoints the major challenges facing plasma-aided nanofabrication and identifies some emerging topics for future research.
引用
收藏
页码:2223 / 2241
页数:19
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