Photoinduced construction of a second covalently bonded organic layer on the Si(111)-7 x 7 surface

被引：13
|
作者：
Cai, Ying Hui [1 ]
Shao, Yan Xia [1 ]
Xu, Guo Qin [1 ]
机构：
[1] Natl Univ Singapore, Dept Chem, Singapore 119260, Singapore
来源：
JOURNAL OF THE AMERICAN CHEMICAL SOCIETY | 2007年 / 129卷 / 27期
关键词：
D O I：
10.1021/ja0716655
中图分类号：
O6 [化学];
学科分类号：
0703 ;
摘要：
3-Chloro-1-propanol dissociatively adsorbs on the Si(111)-7 x 7 surface via the OH dissociation with the C-Cl bond unperturbed at 110 K. The C-Cl bond was then cleaved by a 193 nm photon to produce one radical site on the C atom, which subsequently reacted with one nearby physisorbed benzonitrile molecule via the cyano group to form a second covalently bonded organic layer. The newly generated radical site on the cyano group abstracts a nearby H atom. In this work, we successfully constructed the second chemically attached organic layer on the Si(111)-7 x 7 surface and demonstrated that photochemical methods are powerful tools in organic modification of silicon surfaces.
引用
收藏
页码：8404 / +
页数：3
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