Photoinduced construction of a second covalently bonded organic layer on the Si(111)-7 x 7 surface

被引：13

作者：

Cai, Ying Hui ^{[1
]}

Shao, Yan Xia ^{[1
]}

Xu, Guo Qin ^{[1
]}

机构：

[1] Natl Univ Singapore, Dept Chem, Singapore 119260, Singapore

来源：

JOURNAL OF THE AMERICAN CHEMICAL SOCIETY | 2007年 / 129卷 / 27期

关键词：

D O I：

10.1021/ja0716655

中图分类号：

O6 [化学];

学科分类号：

0703 ;

摘要：

3-Chloro-1-propanol dissociatively adsorbs on the Si(111)-7 x 7 surface via the OH dissociation with the C-Cl bond unperturbed at 110 K. The C-Cl bond was then cleaved by a 193 nm photon to produce one radical site on the C atom, which subsequently reacted with one nearby physisorbed benzonitrile molecule via the cyano group to form a second covalently bonded organic layer. The newly generated radical site on the cyano group abstracts a nearby H atom. In this work, we successfully constructed the second chemically attached organic layer on the Si(111)-7 x 7 surface and demonstrated that photochemical methods are powerful tools in organic modification of silicon surfaces.

引用

页码：8404 / +

页数：3

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