An investigation into the interaction of a XeCl excimer laser with hard tissue

被引:4
|
作者
Murray, AK [1 ]
Dickinson, MR [1 ]
机构
[1] Univ Manchester, Laser Photon Grp, Manchester M13 9PL, Lancs, England
关键词
ablation; dentine; laser-tissue interaction; UV; 308; nm;
D O I
10.1117/12.388039
中图分类号
R318 [生物医学工程];
学科分类号
0831 ;
摘要
An investigation into the interaction of a fibre deliverable, long pulse, xenon chloride (308 nm) excimer laser with hard biotissue has been carried out. The laser produces pulses of 200+ ns as opposed to around 10-20 ns for most of the previously reported data(1,2) The threshold of ablation and the maximum ablation depth (AD) in human molar dentine were found to be 0.30+/-0.05 J/cm(2) and 1.57+/-0.04 mu m/pulse respectively. The threshold for enamel was found to be above the achievable fluence with the available optics. The ablation process was investigated as a function of fluence (similar to 0.1- 6 J/cm(2)), pulse repetition rate (PRR) (5-25 Hz) and number of pulses (500- 4000). Each variable was altered independently of the other two. At a constant number of pulses, ablation depth per pulse was found to increase linearly as a function of fluence, up to a saturation fluence of similar to 4 J/cm(2) Variation of the PRR alone was found to affect both the ablation threshold and the AD. For constant fluence and PRR, AD decreases non-linearly with an increasing number of pulses. This could be because at high pulse numbers the craters are deep, the walls of the crater absorb more energy and as it is increasingly difficult for the debris to escape, shielding of the tissue occurs. Shielding may also be due to absorption in a luminescent plume. At high fluence and PRR, sharp holes were formed in the dentine although charring was sometimes found around the edges. High PRR also induced considerable mechanical damage.
引用
收藏
页码:137 / 143
页数:7
相关论文
共 50 条
  • [41] UVB 308 nm XeCl excimer laser for mycosis fungoides
    Soda, R
    Vidolin, AP
    Esposito, M
    Chimenti, MS
    Di Stefani, A
    Bianchi, L
    EXPERIMENTAL DERMATOLOGY, 2002, 11 (03) : 279 - 279
  • [42] LONGITUDINAL DISCHARGE XECL EXCIMER LASER WITH AUTOMATIC UV PREIONIZATION
    FURUHASHI, H
    HIRAMATSU, M
    GOTO, T
    APPLIED PHYSICS LETTERS, 1987, 50 (14) : 883 - 885
  • [43] Arylazophosphonate containing polymers designed for XeCl excimer laser ablation
    Nobis, MN
    Scherer, C
    Nuyken, O
    Beinhorn, F
    Ihlemann, J
    MACROMOLECULAR MATERIALS AND ENGINEERING, 2000, 275 (02) : 1 - 7
  • [44] XPS study of XeCl excimer-laser-etched InP
    Wrobel, JM
    Moffitt, CE
    Wieliczka, DM
    Dubowski, JJ
    Fraser, JW
    APPLIED SURFACE SCIENCE, 1998, 127 : 805 - 809
  • [45] XPS study of XeCl excimer-laser-etched InP
    Wrobel, Jerzy M.
    Moffitt, Christopher E.
    Wieliczka, David M.
    Dubowski, Jan J.
    Fraser, Jeffrey W.
    Applied Surface Science, 1998, 127-129 : 805 - 809
  • [46] EFFICIENT DYE-LASERS PUMPED BY A XECL EXCIMER LASER
    UCHINO, O
    MIZUNAMI, T
    MAEDA, M
    MIYAZOE, Y
    APPLIED PHYSICS, 1979, 19 (01): : 35 - 37
  • [47] PASSIVE MODE-LOCKING OF A XeCl EXCIMER LASER.
    Cheng Xusan
    Lou Qihong
    Wang Runwen
    Guangxue Xuebao/Acta Optica Sinica, 1985, 5 (07): : 643 - 647
  • [48] PROPERTIES OF CU FILM UNDER XECL EXCIMER LASER IRRADIATION
    WANG, SQ
    ONG, E
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1992, 10 (01): : 149 - 159
  • [49] High-efficiency 2 kW XeCl excimer laser
    K. Haruta
    Y. Saito
    M. Inoue
    Y. Sato
    S. Fujikawa
    A. Suzuki
    H. Nagai
    Applied Physics B, 1999, 68 : 663 - 669
  • [50] 2.5 KHZ HIGH REPETITION RATE XECL EXCIMER LASER
    TAKAGI, S
    OKAMOTO, N
    KAKIZAKI, K
    SATO, S
    GOTO, T
    JOURNAL OF APPLIED PHYSICS, 1990, 68 (11) : 5927 - 5929