Analysis of the Electrical Parameters in SOI n-type Junctionless Nanowire Transistors at High Temperatures

被引:0
作者
Ribeiro, T. A.
Pavanello, M. A.
机构
来源
LATIN AMERICAN ELECTRON DEVICES CONFERENCE (LAEDC 2020) | 2020年
基金
巴西圣保罗研究基金会;
关键词
Threshold Voltage; Carrier Mobility; High Temperature; Junctionless; Nanowires; SOI; PERFORMANCE; MOSFETS; MOBILITY;
D O I
暂无
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
This work studies the effects of the temperature from 300K to 500K on the electrical parameters of SOI n-type junctionless nanowire transistors. The temperature influence on the threshold voltage and the effective carrier mobility were analyzed for narrow fin width. The mobility scattering mechanisms were analyzed and show that nanowire devices have the phonon scattering as it major component, although there is a significant component of the ionized impurity scattering that can be identified as well.
引用
收藏
页数:4
相关论文
共 13 条
  • [1] Compact modeling of triple gate junctionless MOSFETs for accurate circuit design in a wide temperature range
    Antonio Pavanello, Marcelo
    Cerdeira, Antonio
    Doria, Rodrigo Trevisoli
    Ribeiro, Thales Augusto
    Avila-Herrera, Fernando
    Estrada, Magali
    [J]. SOLID-STATE ELECTRONICS, 2019, 159 : 116 - 122
  • [2] Performance of 22 nm Tri-Gate Junctionless Nanowire Transistors at Elevated Temperatures
    Das, Samaresh
    Yu, Ran
    Cherkaoui, Karim
    Razavi, Pedram
    Barraud, Sylvain
    [J]. ECS SOLID STATE LETTERS, 2013, 2 (08) : Q62 - Q65
  • [3] Junctionless Multiple-Gate Transistors for Analog Applications
    Doria, Rodrigo Trevisoli
    Pavanello, Marcelo Antonio
    Trevisoli, Renan Doria
    de Souza, Michelly
    Lee, Chi-Woo
    Ferain, Isabelle
    Akhavan, Nima Dehdashti
    Yan, Ran
    Razavi, Pedram
    Yu, Ran
    Kranti, Abhinav
    Colinge, Jean-Pierre
    [J]. IEEE TRANSACTIONS ON ELECTRON DEVICES, 2011, 58 (08) : 2511 - 2519
  • [4] Low-temperature electrical characterization of junctionless transistors
    Jeon, Dae-Young
    Park, So Jeong
    Mouis, Mireille
    Barraud, Sylvain
    Kim, Gyu-Tae
    Ghibaudo, Gerard
    [J]. SOLID-STATE ELECTRONICS, 2013, 80 : 135 - 141
  • [5] High-Temperature Performance of Silicon Junctionless MOSFETs
    Lee, Chi-Woo
    Borne, Adrien
    Ferain, Isabelle
    Afzalian, Aryan
    Yan, Ran
    Akhavan, Nima Dehdashti
    Razavi, Pedram
    Colinge, Jean-Pierre
    [J]. IEEE TRANSACTIONS ON ELECTRON DEVICES, 2010, 57 (03) : 620 - 625
  • [6] Front- and back-channel mobility in ultrathin SOI-MOSFETs by front-gate split CV method
    Ohata, A.
    Casse, M.
    Cristoloveanu, S.
    [J]. SOLID-STATE ELECTRONICS, 2007, 51 (02) : 245 - 251
  • [7] Effect of Temperature on the Performance of Triple-Gate Junctionless Transistors
    Oproglidis, Theodoros A.
    Karatsori, Theano A.
    Barraud, Sylvain
    Ghibaudo, Gerard
    Dimitriadis, Charalabos A.
    [J]. IEEE TRANSACTIONS ON ELECTRON DEVICES, 2018, 65 (08) : 3562 - 3566
  • [8] Electrical Characterization and Parameter Extraction of Junctionless Nanowire Transistors
    Rudenko, Tamara
    Barraud, Sylvain
    Georgiev, Yordan M.
    Lysenko, Vladimir
    Nazarov, Alexey
    [J]. JOURNAL OF NANO RESEARCH, 2016, 39 : 17 - +
  • [9] Method for Extracting Doping Concentration and Flat-Band Voltage in Junctionless Multigate MOSFETs Using 2-D Electrostatic Effects
    Rudenko, Tamara
    Yu, Ran
    Barraud, Sylvain
    Cherkaoui, Karim
    Nazarov, Alexey
    [J]. IEEE ELECTRON DEVICE LETTERS, 2013, 34 (08) : 957 - 959
  • [10] ON THE UNIVERSALITY OF INVERSION LAYER MOBILITY IN SI MOSFETS .1. EFFECTS OF SUBSTRATE IMPURITY CONCENTRATION
    TAKAGI, S
    TORIUMI, A
    IWASE, M
    TANGO, H
    [J]. IEEE TRANSACTIONS ON ELECTRON DEVICES, 1994, 41 (12) : 2357 - 2362