Si-C alloys with direct band gaps for photoelectric application

被引:23
作者
Fan, Qingyang [1 ,2 ]
Hao, Bingqian [3 ]
Zhao, Yingbo [4 ]
Song, Yanxing [5 ]
Zhang, Wei [5 ]
Yun, Sining [6 ]
机构
[1] Xian Univ Architecture & Technol, Coll Informat & Control Engn, Xian 710055, Peoples R China
[2] Shaanxi Key Lab Nano Mat & Technol, Xian 710055, Peoples R China
[3] Xian Univ Architecture & Technol, Coll Sci, Xian 710055, Peoples R China
[4] Xian Univ Architecture & Technol, Sch Mech & Elect Engn, Xian 710055, Peoples R China
[5] Xidian Univ, Sch Microelect, Xian 710071, Peoples R China
[6] Xian Univ Architecture & Technol, Sch Mat Sci & Engn, Funct Mat Lab FML, Xian 710055, Peoples R China
基金
中国国家自然科学基金; 中国博士后科学基金;
关键词
Novel SiC alloy; Electronic properties; Direct band gap; Effective mass; PHYSICAL-PROPERTIES; ELASTIC-CONSTANTS; SILICON; STABILITY; PHASE; 4H;
D O I
10.1016/j.vacuum.2022.110952
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
In this paper, the novel two Si-C alloys with direct band gap of semiconductor material, namely I-43d SiC and P2/m SiC, are proposed by using density functional theory. To our knowledge, this is the first report that Si-C alloys with a stoichiometric ratio of 1:1 have direct band gaps. The Si-C alloys in the I-43d and P2/m phases have dynamical stability and mechanical stability observed through phonon spectra and elastic constants. The varies of relative enthalpies for I-43d and P2/m SiC with pressure and their stability at 50 GPa and 800 K, suggest the synthesis possibility under high temperatures and pressures. The elastic moduli (B, G, and E) of I-43d and P2/m SiC are slightly larger than the elastic muduli of C2/m-16 SiC and Si3C, C2/m-20 Si(3)C2 and Si4C. In addition, the distribution of electrons effective mass of I-43d SiC in space is equivalent. I-43d SiC has the smallest maximum electrons effective mass and holes effective mass, and the minimum value of holes effective mass appear in b axis. The two SiC alloys have direct band gaps of 0.99 and 1.44 eV, and exhibit excellent optical properties, indicating the feasibility for optoelectronic devices.
引用
收藏
页数:13
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