Crystallization and conductivity of large-domain Nb-doped TiO2 films prepared by electron beam evaporation

被引:2
作者
Schipporeit, S. [1 ,2 ]
Jerman, M. [1 ,3 ]
Mergel, D. [1 ]
机构
[1] Univ Duisburg Essen, Fac Phys, Thin Film Technol Grp, Forsthausweg 2, D-47057 Duisburg, Germany
[2] Univ Duisburg Essen, CENIDE Ctr Nanointegrat Duisburg Essen, D-45141 Essen, Germany
[3] ZWW, Univ Str 2, D-45141 Essen, Germany
关键词
Titanium dioxide; Niobium-doping; Evaporation; X-ray diffraction; Raman spectroscopy; Crystallization; Conductivity; Refractive index; THIN-FILMS; RAMAN-SPECTRA; NIOBIUM; ANATASE; PHASE;
D O I
10.1016/j.tsf.2022.139299
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Thin solid films of titania (TiO2), undoped and doped with niobium (Nb), are prepared by reactive electron-beam evaporation at 250 degrees C and post-heated at temperatures up to 750 degrees C. Nucleation starts at 375 degrees C and Nb-doped films largely crystallize at 420 degrees C, to anatase, as detected by X-ray diffraction (XRD), Raman spectra, and Raman phonon maps. Nb incorporation favors the anatase phase over other crystalline titania phases and leads to an increase in its unit cell volume and a blue shift of the Raman Eg(1) peak. In Raman phonon mapping, films with good conductivity show large domains with similar Raman signals, more than 1 mu m in diameter, larger than the crystalline grain diameter of 70 nm obtained from XRD. Such films exhibit a unit cell volume indicating effective Nb incorporation, and a minimum electrical resistivity of about 200 mu omega cm, sometimes reached already upon annealing at 350 degrees C. These findings suggest that the phonon domains consist of about 200 grains with similar crystalline orientation separated by small-angle boundaries.
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页数:8
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