Hardness of sputter deposited nanocrystalline Ni3Al thin films

被引：13

作者：

Banerjee, Rajarshi ^{[1
]}

机构：

[1] Univ N Texas, Dept Mat Sci & Engn, Denton, TX 76203 USA

来源：

MATERIALS LETTERS | 2007年 / 61卷 / 02期

关键词：

nickel aluminide; thin film; sputtering; ordering; mechanical properties; grain size;

D O I：

10.1016/j.matlet.2006.05.023

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

Nanocrystalline thin films of nominal composition Ni-25 at.% Al have been sputter deposited from a target of the intermetallic compound Ni3Al using different sputtering conditions. Increase in the pressure of sputtering gas resulted in a substantial reduction in the grain size of these nanocrystalline films and a consequent enhancement in their hardness. While films deposited onto heated substrates exhibited larger grain sizes as compared to those deposited on unheated substrates at the same sputtering pressure, the hardness of the former films was substantially higher. The reason for this enhanced hardness is the long-range chemical ordering in films deposited on heated substrates and the formation of L1(2)-Ni3Al, the thermodynamically stable phase for this composition. (c) 2006 Published by Elsevier B.V.

引用

页码：609 / 612

页数：4

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