共 29 条
- [2] Core structure of thermal donors in silicon [J]. PHYSICAL REVIEW LETTERS, 1996, 77 (05) : 861 - 864
- [3] SATELLITE PHONON ABSORPTION-LINES ABOVE THE 875 GHZ RESONANCE OF INTERSTITIAL OXYGEN IN SILICON [J]. JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1987, 26 : 873 - 874
- [4] Ewels CP, 1996, NATO ASI 3 HIGH TECH, V17, P141
- [5] DO OXYGEN MOLECULES CONTRIBUTE TO OXYGEN DIFFUSION AND THERMAL DONOR FORMATION IN SILICON [J]. APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING, 1989, 48 (03): : 219 - 228
- [6] OXYGEN DIFFUSION AND THERMAL DONOR FORMATION IN SILICON [J]. APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING, 1982, 28 (02): : 79 - 92
- [7] Gosele U, 1996, NATO ASI 3 HIGH TECH, V17, P243
- [9] HERRING C, 1991, SEMICONDUCT SEMIMET, V34, P225
- [10] JONES R, 1996, NATO ASI SER 3, V17