Scaling the Suspended-Gate FET: Impact of Dielectric Charging and Roughness

被引:10
作者
Bardon, Marie Garcia [1 ,2 ]
Neves, Herc P. [1 ]
Puers, Robert [2 ]
Van Hoof, Chris [1 ]
机构
[1] Interuniv Microelect Ctr, B-3001 Louvain, Belgium
[2] Katholieke Univ Leuven, B-3000 Louvain, Belgium
关键词
Compact modeling; complimentary metal-oxide-semiconductor (CMOS)-microelectromechanical system (MEMS) integration; dielectric charging; digital switch; roughness; suspended gate field-effect transistor (SG-FET); suspended gate transistor; MODEL;
D O I
10.1109/TED.2009.2039963
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Suspended gate field-effect transistors (SG-FETs) with switching gates are interesting as digital logic switches because of their high I-on/I-off current ratio and their infinite subthreshold slope. However, the limits of scalability of the SG-FETs are still unclear. This paper investigates two effects that could limit scaling: the dielectric charging and the dielectric roughness. To do so, a surface-potential-based model for suspended gate transistors with a mechanically switching gate is presented and validated using experimental data. Devices fabricated in a standard complimentary metal-oxide-semiconductor process are used for the model assessment. The model reproduces the effect of a fixed charge and the effect of a nonideal contact of the gate after pull-in. We show that, at the device dimensions required to follow the International Technology Roadmap for Semiconductors, these effects will be critical.
引用
收藏
页码:804 / 813
页数:10
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