Flow of nanosize cluster-containing plasma in a magnetron discharge

被引:42
作者
Smirnov, Boris M.
Shyjumon, Ibrahimkutty
Hippler, Rainer
机构
[1] Russian Acad Sci, Inst High Temp, Moscow 125412, Russia
[2] Ernst Moritz Arndt Univ Greifswald, Inst Phys, D-17489 Greifswald, Germany
来源
PHYSICAL REVIEW E | 2007年 / 75卷 / 06期
关键词
D O I
10.1103/PhysRevE.75.066402
中图分类号
O35 [流体力学]; O53 [等离子体物理学];
学科分类号
070204 ; 080103 ; 080704 ;
摘要
A magnetron source of silver clusters captured by an argon flow with the quadrupole mass filter is used for the analysis of charged clusters after an orifice of the magnetron chamber, and the size distribution function follows from the analysis of clusters deposited on a silicon substrate by an atomic force microscope. Cluster charge near an orifice results from attachment of ions of a secondary plasma that is a tail of a magnetron plasma, and the cluster charge is mostly positive. The character of passage of a buffer gas flow with metal clusters through an orifice is studied both theoretically and experimentally. Assuming the cone shape of the drift chamber near the orifice, we analyze drift of charged clusters in a buffer gas flow towards the orifice if the electric field inside the drift chamber is created by charged rings on the cone surface. Under experimental conditions, when an equilibrium between the buffer gas flow and cluster flux is violated, a typical voltage of rings and parameters of corona discharge for cluster charging are estimated if the electric field does not allow for clusters to reach walls of the drift chamber. The number density of clusters near the orifice is estimated that increases both due to violation of an equilibrium for the cluster flux inside the buffer gas flow and owing to focusing of the cluster by the electric field that is created by electrodes located near walls and due to diffusion motion of clusters. Processes of cluster charging in the magnetron chamber are analyzed.
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页数:9
相关论文
共 30 条
[1]  
[Anonymous], 2000, PHYS USP, DOI DOI 10.1070/PU2000V043N05ABEH000722
[2]  
[Anonymous], 1984, KINETIC THEORY COAGU
[3]   Reactive magnetron sputtering of TiOx films [J].
Baroch, P ;
Musil, J ;
Vlcek, J ;
Nam, KH ;
Han, JG .
SURFACE & COATINGS TECHNOLOGY, 2005, 193 (1-3) :107-111
[4]   MAGNETIC TIME-OF-FLIGHT PHOTOELECTRON SPECTROMETER FOR MASS-SELECTED NEGATIVE CLUSTER IONS [J].
CHESHNOVSKY, O ;
YANG, SH ;
PETTIETTE, CL ;
CRAYCRAFT, MJ ;
SMALLEY, RE .
REVIEW OF SCIENTIFIC INSTRUMENTS, 1987, 58 (11) :2131-2137
[5]   FLUCTUATIONS OF THE CHARGE ON A DUST GRAIN IN A PLASMA [J].
CUI, CS ;
GOREE, J .
IEEE TRANSACTIONS ON PLASMA SCIENCE, 1994, 22 (02) :151-158
[6]  
Gutzov I., 1995, VITREOUS STATE
[7]   TRANSITION TO PLASMON-LIKE ABSORPTION IN SMALL HG CLUSTERS [J].
HABERLAND, H ;
VONISSENDORFF, B ;
JI, YF ;
KOLAR, T .
PHYSICAL REVIEW LETTERS, 1992, 69 (22) :3212-3215
[8]   FILLING OF MICRON-SIZED CONTACT HOLES WITH COPPER BY ENERGETIC CLUSTER-IMPACT [J].
HABERLAND, H ;
MALL, M ;
MOSELER, M ;
QIANG, Y ;
REINERS, T ;
THURNER, Y .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 1994, 12 (05) :2925-2930
[9]   THIN-FILMS FROM ENERGETIC CLUSTER IMPACT - A FEASIBILITY STUDY [J].
HABERLAND, H ;
KARRAIS, M ;
MALL, M ;
THURNER, Y .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1992, 10 (05) :3266-3271
[10]   THIN-FILM GROWTH BY ENERGETIC CLUSTER IMPACT (ECI) - COMPARISON BETWEEN EXPERIMENT AND MOLECULAR-DYNAMICS SIMULATIONS [J].
HABERLAND, H ;
INSEPOV, Z ;
KARRAIS, M ;
MALL, M ;
MOSELER, M ;
THURNER, Y .
MATERIALS SCIENCE AND ENGINEERING B-SOLID STATE MATERIALS FOR ADVANCED TECHNOLOGY, 1993, 19 (1-2) :31-36