Process control and pulsed laser deposition of materials

被引：0

作者：

Biggers, R ^{[1
]}

Kozlowski, G ^{[1
]}

Jones, J ^{[1
]}

Dempsey, D ^{[1
]}

Kleismit, R ^{[1
]}

Maartense, I ^{[1
]}

Busbee, J ^{[1
]}

Peterson, T ^{[1
]}

Perrin, R ^{[1
]}

机构：

[1] USAF, Res Lab, Wright Patterson AFB, OH 45433 USA

来源：

INTEGRATED FERROELECTRICS | 2000年 / 29卷 / 1-2期

关键词：

process control; pulsed laser deposition; emission sensor; superconductor; ferroelectric;

D O I：

暂无

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

Pulsed-laser deposition (PLD) is a very powerful and rapid deposition technique, which can produce exceptional-quality thin films. Although PLD has tremendous versatility and potential, PLD capabilities are still constrained by a lack of process control. At the Air Force Research Laboratory on-site at Wright-Patterson AFB, we are developing in-situ/real-time control methodologies for PLD and other thin-film deposition processes. We have identified appropriate sensors for closed-loop feedback control and utilized them with YBa2Cu3O7-x, (YBCO) to identify critical process control parameters. Control instrumentation has recently been improved by the addition of moveable fixed-position plume-emission sensors. The reproducibility of YBCO film quality increased significantly when process control was applied to PLD processing. PLD process control techniques were applied during simulated and actual BSTO depositions. A comparison of deposition control with the controlling sensor at different distances from the substrate heater position is discussed. Further process refinement using Lime-resolved spectral components of the PLD plume on subsequent film quality is also discussed.

引用

页码：201 / 211

页数：11