Silicon wire grid polarizer for ultraviolet applications

被引:23
作者
Weber, Thomas [1 ]
Kroker, Stefanie [1 ]
Kaesebier, Thomas [1 ]
Kley, Ernst-Bernhard [1 ]
Tuennermann, Andreas [1 ,2 ]
机构
[1] Univ Jena, Abbe Ctr Photon, Inst Appl Phys, D-07745 Jena, Germany
[2] Fraunhofer Inst Appl Opt & Precis Engn, D-07745 Jena, Germany
关键词
TRANSMISSION GRATINGS; VISIBLE-LIGHT; LITHOGRAPHY; FABRICATION;
D O I
10.1364/AO.53.008140
中图分类号
O43 [光学];
学科分类号
070207 ; 0803 ;
摘要
We present a silicon wire grid polarizer operating down to a wavelength of 300 nm. Besides metallic grating materials, semiconductors also offer appropriate material properties to realize wire grid polarizers in the ultraviolet (UV) spectral range. The presented polarizer with a period of 140 nm was realized by means of electron beam lithography and dry etching using amorphous silicon as the grating material. At a wavelength of 365 nm, a transmission of 42% and an extinction ratio of 90 (19.5 dB) are measured. The spectral bandwidth of these polarizers in the UV-spectral range is about 100 nm. (C) 2014 Optical Society of America.
引用
收藏
页码:8140 / 8144
页数:5
相关论文
共 24 条
[1]   Fabrication of a 50 nm half-pitch wire grid polarizer using nanoimprint lithography [J].
Ahn, SW ;
Lee, KD ;
Kim, JS ;
Kim, SH ;
Park, JD ;
Lee, SH ;
Yoon, PW .
NANOTECHNOLOGY, 2005, 16 (09) :1874-1877
[2]   Fabrication and characterization of a deep ultraviolet wire grid polarizer with a chromium-oxide subwavelength grating [J].
Asano, Kosuke ;
Yokoyama, Satoshi ;
Kemmochi, Atsushi ;
Yatagai, Toyohiko .
APPLIED OPTICS, 2014, 53 (13) :2942-2948
[3]   OPTICAL-PROPERTIES OF THIN-FILMS [J].
ASPNES, DE .
THIN SOLID FILMS, 1982, 89 (03) :249-262
[4]   Application of double patterning technology to fabricate optical elements: Process simulation, fabrication, and measurement [J].
Babin, S. ;
Glushenko, G. ;
Weber, T. ;
Kaesebier, T. ;
Kley, E. -B. ;
Szeghalmi, A. .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 2012, 30 (03)
[5]   THE WIRE GRID AS A NEAR-INFRARED POLARIZER [J].
BIRD, GR ;
PARRISH, M .
JOURNAL OF THE OPTICAL SOCIETY OF AMERICA, 1960, 50 (09) :886-891
[6]   PHOTO-DIODE QUANTUM EFFICIENCY ENHANCEMENT AT 365-NM - OPTICAL AND ELECTRICAL [J].
BOOKER, RL ;
GEIST, JC .
APPLIED OPTICS, 1982, 21 (22) :3987-3989
[7]   SUBWAVELENGTH AMORPHOUS-SILICON TRANSMISSION GRATINGS AND APPLICATIONS IN POLARIZERS AND WAVEPLATES [J].
CHOU, SY ;
DENG, WY .
APPLIED PHYSICS LETTERS, 1995, 67 (06) :742-744
[8]   Fabrication and properties of visible-light subwavelength amorphous silicon transmission gratings [J].
Deng, WY ;
Chou, SY .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1995, 13 (06) :2879-2882
[9]  
Fox Mark., 2012, OPTICAL PROPERTIES S, VSecond
[10]  
Hertz H., 1889, Ann. Phys, V272, P769