Modeling grown-in dislocation multiplication on prismatic slip planes for GaN single crystals

被引:4
作者
Gao, B. [1 ]
Kakimoto, K. [1 ]
机构
[1] Kyushu Univ, Appl Mech Res Inst, Kasuga, Fukuoka 8168580, Japan
关键词
COMPOUND SEMICONDUCTORS; PLASTIC-DEFORMATION; GALLIUM NITRIDE; BULK ALN; DYNAMICS; CONDUCTIVITY; TEMPERATURES; STRENGTH; MOBILITY; BEHAVIOR;
D O I
10.1063/1.4905946
中图分类号
O59 [应用物理学];
学科分类号
摘要
To dynamically model the grown-in dislocation multiplication on prismatic slip planes for GaN single crystal growth, the Alexander-Haasen (AH) model, which was originally used to model the plastic deformation of silicon crystals, is extended to GaN single crystals. By fitting the model to the experimental data, we found that it can accurately describe the plastic deformation of GaN caused by prismatic slip. A set of unified parameters for the AH model at different temperatures can be found. This model provides a possible method to minimize grown-in dislocations caused due to prismatic slip by optimizing growing and cooling conditions during GaN single crystal growth. (C) 2015 AIP Publishing LLC.
引用
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页数:8
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