Deep ultraviolet (DUV) phototransistors with high photoresponsivity are fabricated on ZnGa2O4 grown by metal-organic chemical-vapor deposition. Owing to transistor actions, the photodetector meets to a large photocurrent and optical response. When illuminated with photon wavelength within the range of 200-250 nm, the ZnGa2O4-based phototransistor presented a large responsivity, especially 1.51 X 10(6) A/W as the incident light at 210 nm with 1.73 mu W/cm(2). It was also observed that the photocurrent/dark current ratio and rising time can be improved by gate control, which is related to threshold voltage shifting when under illumination. These results demonstrate ZnGa2O4 based phototransistor is a very promising candidate for DUV optoelectronic devices applications.
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Indian Inst Technol, Dept Met & Mat Engn, Mat Testing Facil, Mat Forming Lab, Madras 600036, Tamil Nadu, IndiaIndian Inst Technol, Dept Met & Mat Engn, Mat Testing Facil, Mat Forming Lab, Madras 600036, Tamil Nadu, India
Ahmad, I
Kottaisamy, M
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机构:Indian Inst Technol, Dept Met & Mat Engn, Mat Testing Facil, Mat Forming Lab, Madras 600036, Tamil Nadu, India
Kottaisamy, M
Rama, N
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机构:Indian Inst Technol, Dept Met & Mat Engn, Mat Testing Facil, Mat Forming Lab, Madras 600036, Tamil Nadu, India
Rama, N
Rao, MSR
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Rao, MSR
Bhattacharya, SS
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机构:Indian Inst Technol, Dept Met & Mat Engn, Mat Testing Facil, Mat Forming Lab, Madras 600036, Tamil Nadu, India