Surface characterization and growth mechanism of laminated Ti3SiC2 crystals fabricated by hot isostatic pressing

被引：33
|
作者：
Wu, Qiong [1 ]
Li, Changsheng [1 ]
Tang, Hua [1 ]
机构：
[1] Jiangsu Univ, Sch Mat Sci & Engn, Zhenjiang 212013, Jiangsu, Peoples R China
来源：
APPLIED SURFACE SCIENCE | 2010年 / 256卷 / 23期
关键词：
Ti3SiC2; Hot isostatic pressing; Growth mechanism; DEFORMATION; TEMPERATURE; MORPHOLOGY; CARBIDE;
D O I：
10.1016/j.apsusc.2010.05.012
中图分类号：
O64 [物理化学（理论化学）、化学物理学];
学科分类号：
070304 ; 081704 ;
摘要：
Laminated Ti3SiC2 crystals were prepared by hot isostatic pressing from Ti, Si, C and Al powders with NaCl additive in argon at 1350 degrees C. The morphology and microstructure of Ti3SiC2 crystals were investigated by means of XRD, SEM, and TEM. The high symmetry and crystalline was revealed by high resolution transmission electronic microscope (HRTEM) and selected area electron diffraction (SAED). The growth mechanism of Ti3SiC2 crystals controlled by two-dimensional nucleation was put forward. The growth pattern of layered steps implies that the growth of the (002) face should undergo two steps, the intermittent two-dimensional nucleation and the continuous lateral spreading of layers on growth faces. (C) 2010 Elsevier B.V. All rights reserved.
引用
收藏
页码：6986 / 6990
页数：5
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