Room temperature CO oxidation catalyzed by NiO particles on mesoporous SiO2 prepared via atomic layer deposition: Influence of pre-annealing temperature on catalytic activity

被引:32
作者
Jeong, Myung-Geun [1 ]
Kim, Il Hee [1 ]
Han, Sang Wook [1 ]
Kim, Dae Han [1 ]
Kim, Young Dok [1 ,2 ]
机构
[1] Sungkyunkwan Univ, Dept Chem, Suwon 440746, South Korea
[2] Korea Res Inst Chem Technol KRICT, Res Ctr Nanocatalysts, Daejeon 305600, South Korea
关键词
Atomic layer deposition; CO oxidation; NiO; Mesoporous SiO2; NICKEL-OXIDE; DEACTIVATION; NANOPARTICLES; NI(111); DESIGN;
D O I
10.1016/j.molcata.2016.01.002
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
We prepared NiO nanoparticles on mesoporous SiO2 using atomic layer deposition and additionally annealed the prepared samples at four different temperatures (300-750 degrees C) under dry air. NiO nanoparticles had lateral sizes less than similar to 2 nm up to 600 degrees C, whereas annealing at a higher temperature (750 degrees C) resulted in a significant agglomeration of NiO, with the formation of 30 nm-sized particles. Annealing at a higher temperature resulted in a reduction in carbon impurities in the annealing temperature range of 300-600 degrees C. Among the four samples annealed at different temperatures, the 450 degrees C-annealed sample showed the highest CO oxidation activity at room temperature. CO oxidation reactivity of this sample initially decreased with reaction time; however, the deactivation became less pronounced over time, with maintenance of 60% of the initial activity of this catalyst after 680 min. Furthermore, 450 degrees C-annealing of used catalyst resulted in full recovery of the initial CO oxidation reactivity. These results suggest that ALD followed by annealing is a promising strategy for the fabrication of highly efficient and stable catalysts consisting of nanoparticles incorporated in the mesopores of a high-surface area support. (C) 2016 Elsevier B.V. All rights reserved.
引用
收藏
页码:87 / 93
页数:7
相关论文
共 40 条
[21]   Towards fabrication of high-performing organic photovoltaics: new donor-polymer, atomic layer deposited thin buffer layer and plasmonic effects [J].
Lim, Dong Chan ;
Kim, Kwang-Dae ;
Park, Sun-Young ;
Hong, Eun Mi ;
Seo, Hyun Ook ;
Lim, Jae Hong ;
Lee, Kyu Hwan ;
Jeong, Yongsoo ;
Song, Changsik ;
Lee, Eunji ;
Kim, Young Dok ;
Cho, Shinuk .
ENERGY & ENVIRONMENTAL SCIENCE, 2012, 5 (12) :9803-9807
[22]   Protein-Nanoparticle Interactions: Opportunities and Challenges [J].
Mahmoudi, Morteza ;
Lynch, Iseult ;
Ejtehadi, Mohammad Reza ;
Monopoli, Marco P. ;
Bombelli, Francesca Baldelli ;
Laurent, Sophie .
CHEMICAL REVIEWS, 2011, 111 (09) :5610-5637
[23]   Localized Surface Plasmon Resonance Sensors [J].
Mayer, Kathryn M. ;
Hafner, Jason H. .
CHEMICAL REVIEWS, 2011, 111 (06) :3828-3857
[24]   Heterogeneous gold-based catalysis for green chemistry: Low-temperature CO oxidation and propene oxidation [J].
Min, Byoung Koun ;
Friend, Cynthia M. .
CHEMICAL REVIEWS, 2007, 107 (06) :2709-2724
[25]   The preferential oxidation of CO in hydrogen rich streams over platinum doped nickel oxide catalysts [J].
Mohamed, Ziyaad ;
Dasireddy, Venkata D. B. C. ;
Singh, Sooboo ;
Friedrich, Holger B. .
APPLIED CATALYSIS B-ENVIRONMENTAL, 2016, 180 :687-697
[26]  
Moulder J.F., 1979, HDB XRAY PHOTOELECTR
[27]   Catalyst Design with Atomic Layer Deposition [J].
O'Neill, Brandon J. ;
Jackson, David H. K. ;
Lee, Jechan ;
Canlas, Christian ;
Stair, Peter C. ;
Marshall, Christopher L. ;
Elam, Jeffrey W. ;
Kuech, Thomas F. ;
Dumesic, James A. ;
Huber, George W. .
ACS CATALYSIS, 2015, 5 (03) :1804-1825
[28]   On the Mechanism of Low-Temperature CO Oxidation on Ni(111) and NiO(111) Surfaces [J].
Peng, Guowen ;
Merte, Lindsay R. ;
Knudsen, Jan ;
Vang, Ronnie T. ;
Laegsgaard, Erik ;
Besenbacher, Flemming ;
Mavrikakis, Manos .
JOURNAL OF PHYSICAL CHEMISTRY C, 2010, 114 (49) :21579-21584
[29]   A Review on CO Oxidation Over Copper Chromite Catalyst [J].
Prasad, R. ;
Singh, Pratichi .
CATALYSIS REVIEWS-SCIENCE AND ENGINEERING, 2012, 54 (02) :224-279
[30]  
Qiao BT, 2011, NAT CHEM, V3, P634, DOI [10.1038/NCHEM.1095, 10.1038/nchem.1095]