Patterning of YBCO thin films by ion implantation and magneto-optical investigations

YBa2Cu3O7-delta thin films deposited by pulsed laser deposition were patterned by ion implantation. The patterning technique is based on the local disordering of the crystal structure due to elastic collisions of the implanted O+-ions and thus on a strong breakdown of superconductivity in the irradiated areas. With this patterning method circular and meandering structures with a size of 1 mm were prepared for investigations regarding high current applications. O+-ions with an energy of 180 keV were used to avoid a contamination of the film. The achieved structures were investigated concerning a dependence on the dose by means of RBS, XRD, AFM and magneto-optical characterization. Using a fluence of 5 x 10(14) O+/cm(2) a fully planar and stable structure can be obtained. The patterning depth can be adjusted by varying the implantation energy. So this technique was also used successfully on YBCO thin films covered already with a 200 nm Au top layer. (C) 1998 Elsevier Science B.V.