Optical properties and microstructure of CeO2-SiO2 composite thin films

被引:19
作者
Koo, WH
Jeoung, SM
Choi, SH
Jo, SJ
Baik, HK
Lee, SJ
Song, KM
机构
[1] Yonsei Univ, Dept Engn Met, Seoul 120749, South Korea
[2] Kyungsung Univ, Dept Mat Engn, Pusan 608736, South Korea
[3] KonKuk Univ, Dept Appl Phys, Chungju 380701, South Korea
关键词
D O I
10.1016/j.tsf.2004.03.042
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
CeO2-SiO2 composite thin films were prepared by e-beam evaporation and ion beam-assisted deposition (IBAD) using an End-Hall ion source. The refractive index of composite thin films exhibited a maximum value at 20-35% SiO2 fraction, indicating the highest packing density. Optical analysis revealed that the transmittance and reflectance spectra of composite films were consistent with the results of the refractive index. The results from X-ray diffractometry (XRD), atomic force microscopy (AFM) and scanning electron microscopy (SEM) measurements showed that composite thin films containing 20-35% SiO2 concentration had a dense and smooth amorphous surface, compared to the roughened granular structure of the pure SiO2 and CeO2 thin films. (C) 2004 Elsevier B.V. All rights reserved.
引用
收藏
页码:28 / 31
页数:4
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