An environment-dependent interatomic potential for silicon carbide: calculation of bulk properties, high-pressure phases, point and extended defects, and amorphous structures

被引:43
|
作者
Lucas, G. [1 ]
Bertolus, M. [2 ]
Pizzagalli, L. [3 ]
机构
[1] Sulzer Metco AG, CH-5610 Wohlen, Switzerland
[2] CEA, DEN, DEC SESC, Ctr Cadarache, F-13108 St Paul Les Durance, France
[3] Univ Poitiers, SP2MI Teleport 2, CNRS, UMR 6630, F-86962 Futuroscope, France
关键词
UNDISSOCIATED SCREW DISLOCATIONS; AB-INITIO CALCULATION; MOLECULAR-DYNAMICS; ELECTRONIC-PROPERTIES; DIAMOND; SI; SEMICONDUCTORS; SIMULATION; STABILITY; VACANCIES;
D O I
10.1088/0953-8984/22/3/035802
中图分类号
O469 [凝聚态物理学];
学科分类号
070205 ;
摘要
An interatomic potential has been developed to describe interactions in silicon, carbon and silicon carbide, based on the environment-dependent interatomic potential (EDIP) (Bazant et al 1997 Phys. Rev. B 56 8542). The functional form of the original EDIP has been generalized and two sets of parameters have been proposed. Tests with these two potentials have been performed for many properties of SiC, including bulk properties, high-pressure phases, point and extended defects, and amorphous structures. One parameter set allows us to keep the original EDIP formulation for silicon, and is shown to be well suited for modelling irradiation-induced effects in silicon carbide, with a very good description of point defects and of the disordered phase. The other set, including a new parametrization for silicon, has been shown to be efficient for modelling point and extended defects, as well as high-pressure phases.
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页数:13
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