Cathodoluminescence and Raman research of V-shape inverted pyramid in HVPE grown GaN film

被引:7
|
作者
Wei, T. B. [1 ]
Ma, P. [1 ]
Duan, R. F. [1 ]
Wang, J. X. [1 ]
Li, J. M. [1 ]
Liu, Zh. [1 ]
Zeng, Y. P. [1 ]
机构
[1] Chinese Acad Sci, Inst Semicond, Beijing 100083, Peoples R China
关键词
GaN; HVPE; V-shape defects; cathodoluminescence; red emission;
D O I
10.1016/j.matlet.2006.12.065
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Thick GaN films with high quality have been grown on (0001) sapphire substrate in a home-made vertical HVPE reactor. Micron-size hexagonal pits with inverted pyramid shape appear on the film surface, which have six triangular {10-11} facets. These I {10-11} facets show strong luminescence emission and are characteristic of doped n-type materials. Broad red emission is suppressed in {10-11} facets and is only found at the flat region out of the pit, which is related with the decreasing defects on {10-11} facets. Low CL emission intensity is observed at the apex of V-shape pits due to the enhanced nonradiative recombination. Raman spectra show that there are higher carrier concentration and low strain in the pit in comparison to the flat region out of the pit. The strain relaxation may be the main mechanism of the V-shape pits formation on the GaN film surface. (c) 2006 Elsevier B.V. All rights reserved.
引用
收藏
页码:3882 / 3885
页数:4
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