High Performance Ultrathin SnO2 Thin-Film Transistors by Sol-Gel Method

被引:33
作者
Jang, Bongho [1 ]
Kim, Taegyun [1 ]
Lee, Sojeong [1 ]
Lee, Won-Yong [1 ]
Kang, Hongki [2 ,3 ]
Cho, Chan Seob [1 ]
Jang, Jaewon [1 ]
机构
[1] Kyungpook Natl Univ, Sch Elect Engn, Daegu 41566, South Korea
[2] Korea Adv Inst Sci & Technol, Dept Bio & Brain Engn, Daejeon 34141, South Korea
[3] Korea Adv Inst Sci & Technol, Informat & Elect Res Inst, Daejeon 34141, South Korea
基金
新加坡国家研究基金会;
关键词
Sol-gel; SnO2; thin film transistors; quantum confinement; LAYER;
D O I
10.1109/LED.2018.2849689
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Sol-gel processed ultrathin nanostructured SnO2 thin-film transistors were successfully fabricated on a SiO2 /Si substrate without using a self-aligned monolayer or high-k insulator, which may be unsuitable techniques for the commercial fabrication of complementary metal-oxide-semiconductors. The highest extracted field mobilitywas approximately 100cm(2)/V.s. In addition, by controlling the SnO2 film thickness, we successfully increased the on/off current ratio to similar to 107. The electrical performance of the proposed transistors is sufficient for high-resolution liquid crystal or organic light-emitting diode displays, which require a high field-effect mobility (>10 cm(2)/V.s) and high on/off current ratio (>106). Ultrathin SnO2 is also a promising rare-metal-free starting matrix for ternary and quaternary alloys, showing promising electric properties.
引用
收藏
页码:1179 / 1182
页数:4
相关论文
共 19 条
[1]   Transparent thin-film transistors with zinc indium oxide channel layer [J].
Dehuff, NL ;
Kettenring, ES ;
Hong, D ;
Chiang, HQ ;
Wager, JF ;
Hoffman, RL ;
Park, CH ;
Keszler, DA .
JOURNAL OF APPLIED PHYSICS, 2005, 97 (06)
[2]   High-Mobility Thin-Film Transistors with Polycrystalline In-Ga-O Channel Fabricated by DC Magnetron Sputtering [J].
Ebata, Kazuaki ;
Tomai, Shigekazu ;
Tsuruma, Yuki ;
Iitsuka, Takashi ;
Matsuzaki, Shigeo ;
Yano, Koki .
APPLIED PHYSICS EXPRESS, 2012, 5 (01)
[3]   Resistivity of polycrystalline zinc oxide films: current status and physical limit [J].
Ellmer, K .
JOURNAL OF PHYSICS D-APPLIED PHYSICS, 2001, 34 (21) :3097-3108
[4]   Amorphous IZO TTFTs with saturation mobilities exceeding 100 cm2/Vs [J].
Fortunato, E. ;
Barquinha, P. ;
Pimentel, A. ;
Pereira, L. ;
Goncalves, G. ;
Martins, R. .
PHYSICA STATUS SOLIDI-RAPID RESEARCH LETTERS, 2007, 1 (01) :R34-R36
[5]  
Haxel G.B., 2002, US GEOL SURV FACT SH, V87, P2
[6]   Depletion layer thickness and Schottky type carrier injection at the interface between Pt electrodes and (Ba, Sr)TiO3 thin films [J].
Hwang, CS ;
Lee, BT ;
Kang, CS ;
Lee, KH ;
Cho, HJ ;
Hideki, H ;
Kim, WD ;
Lee, SI ;
Lee, MY .
JOURNAL OF APPLIED PHYSICS, 1999, 85 (01) :287-295
[7]   Fully Inkjet-Printed Transparent Oxide Thin Film Transistors Using a Fugitive Wettability Switch [J].
Jang, Jaewon ;
Kang, Hongki ;
Chakravarthula, Himamshu C. Nallan ;
Subramanian, Vivek .
ADVANCED ELECTRONIC MATERIALS, 2015, 1 (07)
[8]   Transparent High-Performance Thin Film Transistors from Solution-Processed SnO2/ZrO2 Gel-like Precursors [J].
Jang, Jaewon ;
Kitsomboonloha, Rungrot ;
Swisher, Sarah L. ;
Park, Eung Seok ;
Kang, Hongki ;
Subramanian, Vivek .
ADVANCED MATERIALS, 2013, 25 (07) :1042-1047
[9]   1/f noise of SnO2 nanowire transistors [J].
Ju, Sanghyun ;
Chen, Pochiang ;
Zhou, Chongwu ;
Ha, Young-geun ;
Facchetti, Antonio ;
Marks, Tobin J. ;
Kim, Sun Kook ;
Mohammadi, Saeed ;
Janes, David B. .
APPLIED PHYSICS LETTERS, 2008, 92 (24)
[10]   Present status of amorphous In-Ga-Zn-O thin-film transistors [J].
Kamiya, Toshio ;
Nomura, Kenji ;
Hosono, Hideo .
SCIENCE AND TECHNOLOGY OF ADVANCED MATERIALS, 2010, 11 (04)