Double spin-torque magnetic tunnel junction devices for last-level cache applications

被引:23
作者
Hu, G. [1 ]
Safranski, C. [1 ]
Sun, J. Z. [1 ]
Hashemi, P. [1 ]
Brown, S. L. [1 ]
Bruley, J. [1 ]
Buzi, L. [1 ]
D'Emic, C. P. [1 ]
Galligan, E. [1 ]
Gottwald, M. G. [1 ]
Gunawan, O. [1 ]
Lee, J. [1 ]
Karimeddiny, S. [1 ]
Trouilloud, P. L. [1 ]
Worledge, D. C. [1 ]
机构
[1] IBM Samsung, IBM TJ Watson Res Ctr, MRAM Alliance, Yorktown Hts, NY USA
来源
2022 INTERNATIONAL ELECTRON DEVICES MEETING, IEDM | 2022年
关键词
D O I
10.1109/IEDM45625.2022.10019402
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
We experimentally demonstrate reliable 300 ps switching in arrays of 35 nm double spin-torque magnetic tunnel junctions (DS-MTJs), and also demonstrate a new free-layer design with improved activation energy and magnetoresistance. We establish a new method to characterize the DS-MTJ devices for materials feedback, by introducing and experimentally verifying a simple device-physics model. The model and data show that, compared to a single MTJ (SMTJ), the DS-MTJ has lower switching current, faster switching speed, and better dependence on resistance-area product (RA), meeting key requirements for last-level cache.
引用
收藏
页数:4
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