Recent Progress in Crystal Growth of Bulk GaN

被引:5
|
作者
Bockowski, M. [1 ]
Grzegory, I [1 ]
机构
[1] Polish Acad Sci, Inst High Pressure Phys, Sokolowska 29-37, PL-01142 Warsaw, Poland
基金
欧盟地平线“2020”;
关键词
crystal growth from solution; crystal growth from gas phase; gallium nitride (GaN); VAPOR-PHASE EPITAXY; GALLIUM NITRIDE; HIGH-PRESSURE; HVPE-GAN; QUALITY; N-2;
D O I
10.12693/APhysPolA.141.167
中图分类号
O4 [物理学];
学科分类号
0702 ;
摘要
State of the art in crystallization of bulk GaN is reviewed and discussed. Fundamental physical barriers making crystal growth of GaN difficult are indicated. The Na-flux, ammonothermal and halide vapor phase epitaxy methods are presented as the most advanced and promising ones. The high nitrogen pressure solution approach developed at IHPP PAS is mentioned as a starting point of bulk GaN research.
引用
收藏
页码:167 / 174
页数:8
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