Comparative study on methods to structure sapphire

被引:11
作者
Crunteanu, A [1 ]
Hoffmann, P
Pollnau, M
Buchal, C
机构
[1] Swiss Fed Inst Technol, Appl Photon Lab, Inst Biomed Imaging Opt & Bioengn, CH-1015 Lausanne, Switzerland
[2] Forschungszentrum Julich, IT, Inst Schichten & Grenzflachen, D-52425 Julich, Germany
关键词
sapphire; laser microstructuring; ion beam implantation; reactive ion etching;
D O I
10.1016/S0169-4332(02)01382-X
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
Ti:sapphire is an attractive material for applications as a tunable or short-pulse laser and as a broadband light source in low-coherence interferometry. We investigated several methods to fabricate rib structures in sapphire that can induce channel waveguiding in Ti:sapphire planar waveguides. These methods include direct laser ablation, reactive ion etching, and ion beam implantation followed by wet chemical etching. With the latter two methods, we fabricated channels with depths of up to 1.5 mum. Reactive ion etching through laser-structured polyimide contact-masks has so far provided the best results in terms of definition and roughness of the etched structures. (C) 2002 Elsevier Science B.V. All rights reserved.
引用
收藏
页码:322 / 326
页数:5
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