Critical thickness calculations for InGaN/GaN

被引:202
作者
Holec, D. [1 ]
Costa, P. M. F. J. [1 ]
Kappers, M. J. [1 ]
Humphreys, C. J. [1 ]
机构
[1] Univ Cambridge, Dept Mat Sci & Met, Cambridge CB2 3QZ, England
基金
英国工程与自然科学研究理事会;
关键词
line defects; nitrides; semiconducting gallium compounds;
D O I
10.1016/j.jcrysgro.2006.12.054
中图分类号
O7 [晶体学];
学科分类号
0702 ; 070205 ; 0703 ; 080501 ;
摘要
A model based on the overall energy balance is used to calculate the critical thickness for an InGaN epitaxial layer on a GaN substrate. The critical thickness values as a function of the indium content are found to be lower than values predicted by models proposed by Fischer or People and Bean. We also used the energy balance model to estimate the effect of the hexagonal symmetry of wurtzite materials on the critical thickness; this results in reduction of the critical thickness by as much as 20% of its corresponding isotropic value. From the small amount of experimental data available we conclude that the energy balance model is more appropriate for describing the critical thickness of the InGaN/GaN material system than the models developed by Fischer or People and Bean. (c) 2007 Elsevier B.V. All rights reserved.
引用
收藏
页码:314 / 317
页数:4
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