Effect of wetting layers on the strain and electronic structure of InAs self-assembled quantum dots

被引:75
作者
Lee, S
Lazarenkova, OL
von Allmen, P
Oyafuso, F
Klimeck, G
机构
[1] CALTECH, Jet Prop Lab, Pasadena, CA 91109 USA
[2] Purdue Univ, Sch Elect & Comp Engn, Network Computat Nantechnol, W Lafayette, IN 47906 USA
基金
美国国家科学基金会;
关键词
D O I
10.1103/PhysRevB.70.125307
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
The effect of wetting layers on the strain and electronic structure of InAs self-assembled quantum dots grown on GaAs is investigated with an atomistic valence-force-field model and an empirical tight-binding model. By comparing a dot with and without a wetting layer, we find that the inclusion of the wetting layer weakens the strain inside the dot by only 1% relative change, while it reduces the energy gap between a confined electron and hole level by as much as 10%. The small change in the strain distribution indicates that strain relaxes only little through the thin wetting layer. The large reduction of the energy gap is attributed to the increase of the confining-potential width rather than the change of the potential height. First-order perturbation calculations or, alternatively, the addition of an InAs disk below the quantum dot confirm this conclusion. The effect of the wetting layer on the wave function is qualitatively different for the weakly confined electron state and the strongly confined hole state. The electron wave function shifts from the buffer to the wetting layer, while the hole shifts from the dot to the wetting layer.
引用
收藏
页码:125307 / 1
页数:7
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