Insertion of a thin highly doped crystalline layer in silicon heterojunction solar cells: Simulation and perspectives towards a highly efficient cell concept

被引:11
作者
Carrere, T. [1 ,2 ,3 ]
Varache, R. [1 ]
Munoz, D. [1 ]
Kleider, J. P. [2 ]
机构
[1] CEA, INES, LITEN, Lab HET, F-73375 Le Bourget Du Lac, France
[2] LGEP, UMR8507, F-91192 Gif Sur Yvette, France
[3] French Environm & Energy Management Agcy, F-49004 Angers 01, France
关键词
DEFECT-POOL MODEL; RECOMBINATION; CONDUCTANCE; JUNCTIONS;
D O I
10.1063/1.4908189
中图分类号
X [环境科学、安全科学];
学科分类号
08 ; 0830 ;
摘要
An emerging cell concept based on silicon heterojunctions called hetero-homojunction is investigated by means of numerical simulations. Compared to the usual amorphous/crystalline silicon (a-Si:H/c-Si) heterojunction architecture, the hetero-homojunction cell contains an additional thin and highly doped (p(+))- or (n(+))-c-Si layer at the front or back (i) a-Si:H/(n)c-Si interface, respectively. In this paper, we show the dependence of solar cell performance on the additional heavily doped c-Si layer parameters (thickness and doping) and a-Si: H/c-Si interface properties. Insertion of the (p(+)) c-Si improves the cell power conversion efficiency by almost 1% absolute and lowers its sensitivity to a-Si: H/c-Si interface defects. Improved field effect passivation leading to higher open circuit voltage and fill factor is evidenced and the added layer is optimized with regard to hetero-homojunction cell efficiency. The (n(+)) c-Si layer addition also decreases the recombination rate at the back hetero-interface but does not improve significantly the conversion efficiency. The latter result is finally discussed. (C) 2015 AIP Publishing LLC.
引用
收藏
页数:12
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